Naslov
Fabrication of monolithic microfluidic channels in diamond with ion beam lithography

Autori
Picollo, F. ; Battiato, A. ; Boarino, L. ; Ditalia Tchernij, S. ; Enrico, E. ; Forneris, J. ; Gilardino, A. ; Jakšić, Milko ; Sardi, F. ; Skukan, Natko ; Tengattini, A. ; Olivero, P. ; Re, A. ; Vittone, E.

Izvornik
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (0168-583X) 404 (2017); 193-197

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
Deep ion beam lithography ; Diamond ; Microfluidic ; Fluorescent imaging

Sažetak
In the present work, we report on the monolithic fabrication by means of ion beam lithography of hollow micro-channels within a diamond substrate, to be employed for microfluidic applications. The fabrication strategy takes advantage of ion beam induced damage to convert diamond into graphite, which is characterized by a higher reactivity to oxidative etching with respect to the chemically inert pristine structure. This phase transition occurs in sub-superficial layers thanks to the peculiar damage profile of MeV ions, which mostly damage the target material at their end of range. The structures were obtained by irradiating commercial CVD diamond samples with a micrometric collimated C+ ion beam at three different energies (4 MeV, 3.5 MeV and 3 MeV) at a total fluence of 2 x 10(16) cm(-2). The chosen multiple-energy implantation strategy allows to obtain a thick box-like highly damaged region ranging from 1.6 mu m to 2.1 mu m below the sample surface. High-temperature annealing was performed to both promote the graphitization of the ion-induced amorphous layer and to recover the pristine crystalline structure in the cap layer. Finally, the graphite was removed by ozone etching, obtaining monolithic microfluidic structures.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

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