Naslov
Investigation of thermal stability of Al-Mo thin films

Autori
Sorić, Marija

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

Izvornik
Symposium in memory of Jovica Ivkov / Popčević, Petar ; Smontara, Ana - Zagreb, 2017, 16-16

ISBN
978-953-7666-15-6

Skup
One-day scientific meeting in memory of Jovica Ivkov

Mjesto i datum
Zagreb, Hrvatska, 24.02.2017

Vrsta sudjelovanja
Pozvano predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
Al-Mo thin films, resitivity, thermal stability

Sažetak
Thin AlxMo100-x films (40 ≤ x ≤ 90 with x in steps of 5 at % Al) were prepared by magnetron co-deposition onto alumina, glass, and sapphire substrates at room temperature. The film thickness was about 400 nm, and they were amorphous for 45 ≤ x ≤ 85. The films' structural changes upon heating were investigated by measurement of the electrical resistivity variation with temperature, ρ(T), during the isochronal heating. Thus obtained results were complemented, and conclusions confirmed, by GIXRD analysis for selected heating temperatures. The dynamical temperatures of crystallization, Tx, were determined from the sharp increase of the derivative of ρ with respect to temperature. No systematic dependence of Tx on film substrate has been observed. Except for the Al85Mo15 film, the ρ of the amorphous films increase on the crystallization. The temperature of crystallization exhibits maximum around 530°C for alloy compositions with x = 55 and 60. Electrical resistivity of both amorphous and crystallized films show a strong dependence on alloy composition, with a maximum for Al75Mo25 alloy. The resistivity of Al75Mo25 film is very large and amounts to 1000 μΩcm and 3000 μΩcm in amorphous and crystallized film, respectively, with the large negative temperature coefficient of – 10×10–4 K–1 and –14×10–4 K–1, respectively

Izvorni jezik
Engleski

Znanstvena područja
Fizika

POVEZANOST RADA