Pregled bibliografske jedinice broj: 886172
In situ characterization of sputtered thin film optical coatings using a normal incidence laser reflectometer
In situ characterization of sputtered thin film optical coatings using a normal incidence laser reflectometer // Journal of vacuum science & technology. A, 10 (1992), 4; 939-944 doi:10.1116/1.577882 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 886172 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
In situ characterization of sputtered thin film optical coatings using a normal incidence laser reflectometer
Autori
Babić, Dubravko I. ; Reynolds, Thomas E. ; Hu, Evelyn L. ; Bowers, John E.
Izvornik
Journal of vacuum science & technology. A (0734-2101) 10
(1992), 4;
939-944
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Reflectometers ; Sputter deposition ; Dielectric thin films ; Laser beams ; Computer systems
Sažetak
We will demonstrate the implementation and the use of a normal incidence semiconductor laser reflectometer as an in situ monitoring tool in a computer automated system for reactive sputter deposition of Si/SiOx/SiNx dielectric films. An anode with a viewing hole that was designed specifically for this purpose enables the introduction of both the sputtering gases and the collimated laser beam into the vacuum chamber normal to the processed wafer surface. We will discuss the reflectometer design considerations and the automated data acquisition. We will also demonstrate the use of a normal incidence reflectivity measurement system for in situ determination of the optical deposition rate and material properties such as the refractive index and the absorption loss.
Izvorni jezik
Engleski
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
