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Pregled bibliografske jedinice broj: 885520

Probing high-energy ion-implanted silicon by micro-Raman spectroscopy


Kopsalis, I.; Paneta, V.; Kokkoris, M.; Liarokapis, E.; Erich, M.; Petrović, S.; Fazinić, Stjepko; Tadić, Tonči
Probing high-energy ion-implanted silicon by micro-Raman spectroscopy // Journal of Raman spectroscopy, 45 (2014), 8; 650-656 doi:10.1002/jrs.4507 (međunarodna recenzija, članak, znanstveni)


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Naslov
Probing high-energy ion-implanted silicon by micro-Raman spectroscopy

Autori
Kopsalis, I. ; Paneta, V. ; Kokkoris, M. ; Liarokapis, E. ; Erich, M. ; Petrović, S. ; Fazinić, Stjepko ; Tadić, Tonči

Izvornik
Journal of Raman spectroscopy (0377-0486) 45 (2014), 8; 650-656

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
ion implantation ; channeling ; silicon amorphization ; phonon confinement ; lattice distortions

Sažetak
The effect of ion implantation (4MeV(12)C(2+), 5MeV(16)O(2+), and 8MeV(28)Si(2+)) on [110] silicon wafers in channeling and random orientation is investigated by micro-Raman spectroscopy. The profiles were measured using Scanning Electron Microscope (SEM) showing that the ions were penetrating deeper inside the wafer in the channeling case creating a 1-2 mu m wide strongly modified region and agreeing with the d-nuclear reaction analysis measurements. Micro-Raman spectroscopy was employed for the assessment of the lattice damage, probing the side surface of the cleaved wafers at submicron step. The phonon modifications show strong lattice distortions in zones parallel to the front surface of the wafers and at depths, which agree with the results of the characterization techniques. In these strongly damaged zones, there is a substantial reduction in the phonon intensity, a small shift in wavenumber position, and a large increase in the phonon width. On the basis of a modification of the phonon confinement model that takes under consideration the laser beam profile, the reduction in intensity of scattered light, and the nanocrystallite size distribution from the simulation of the lattice displacements, the main characteristics of the Raman spectra could be reproduced for the random C and O implantations. The results indicate that at a critical doping level, the induced defects and lattice distortions relax by breaking the silicon single crystal into nanocrystallites, thus creating the observed zones of strongly distorted lattice.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Ustanove:
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Tonči Tadić (autor)

Avatar Url Stjepko Fazinić (autor)

Poveznice na cjeloviti tekst rada:

doi onlinelibrary.wiley.com

Citiraj ovu publikaciju:

Kopsalis, I.; Paneta, V.; Kokkoris, M.; Liarokapis, E.; Erich, M.; Petrović, S.; Fazinić, Stjepko; Tadić, Tonči
Probing high-energy ion-implanted silicon by micro-Raman spectroscopy // Journal of Raman spectroscopy, 45 (2014), 8; 650-656 doi:10.1002/jrs.4507 (međunarodna recenzija, članak, znanstveni)
Kopsalis, I., Paneta, V., Kokkoris, M., Liarokapis, E., Erich, M., Petrović, S., Fazinić, S. & Tadić, T. (2014) Probing high-energy ion-implanted silicon by micro-Raman spectroscopy. Journal of Raman spectroscopy, 45 (8), 650-656 doi:10.1002/jrs.4507.
@article{article, author = {Kopsalis, I. and Paneta, V. and Kokkoris, M. and Liarokapis, E. and Erich, M. and Petrovi\'{c}, S. and Fazini\'{c}, Stjepko and Tadi\'{c}, Ton\v{c}i}, year = {2014}, pages = {650-656}, DOI = {10.1002/jrs.4507}, keywords = {ion implantation, channeling, silicon amorphization, phonon confinement, lattice distortions}, journal = {Journal of Raman spectroscopy}, doi = {10.1002/jrs.4507}, volume = {45}, number = {8}, issn = {0377-0486}, title = {Probing high-energy ion-implanted silicon by micro-Raman spectroscopy}, keyword = {ion implantation, channeling, silicon amorphization, phonon confinement, lattice distortions} }
@article{article, author = {Kopsalis, I. and Paneta, V. and Kokkoris, M. and Liarokapis, E. and Erich, M. and Petrovi\'{c}, S. and Fazini\'{c}, Stjepko and Tadi\'{c}, Ton\v{c}i}, year = {2014}, pages = {650-656}, DOI = {10.1002/jrs.4507}, keywords = {ion implantation, channeling, silicon amorphization, phonon confinement, lattice distortions}, journal = {Journal of Raman spectroscopy}, doi = {10.1002/jrs.4507}, volume = {45}, number = {8}, issn = {0377-0486}, title = {Probing high-energy ion-implanted silicon by micro-Raman spectroscopy}, keyword = {ion implantation, channeling, silicon amorphization, phonon confinement, lattice distortions} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus


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  • Scopus


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