Pregled bibliografske jedinice broj: 883469
Enhanced oxidation of nickel at room temperature by low-energy oxygen implantation
Enhanced oxidation of nickel at room temperature by low-energy oxygen implantation // Croatica chemica acta, 90 (2017), 2; 163-168 doi:10.5562/cca3149 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 883469 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Enhanced oxidation of nickel at room temperature by low-energy oxygen implantation
Autori
Peter, Robert ; Šarić, Iva ; Petravić, Mladen
Izvornik
Croatica chemica acta (0011-1643) 90
(2017), 2;
163-168
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Oxidation of Ni ; XPS, ion-beam bombardment ; Parabolic growth rate ; Oxygen implantation ; NiO oxidation in oxygen atmosphere
Sažetak
The formation of oxide films on pure Ni surfaces by low energy oxygen ion-beam bombardment at room temperature was studied by X-ray photoelectron spectroscopy. Ion-induced oxidation is more efficient in creating thin NiO films on Ni surfaces than oxidation in oxygen atmosphere. The oxide thickness of bombarded samples is related to the penetration depth of oxygen ions in Ni and scales with the dose of implanted oxygen as 1/6. This type of oxide growth is predicted theoretically for diffusion of Ni cations by doubly charged cation vacancies, which creation and mobility is greatly enhanced by ion-irradiation.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Sveučilište u Rijeci - Odjel za fiziku
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
