Naslov
In-depth profiling of TiO2 films grown by Atomic Layer Deposition for the nitionol alloy coating

Autori
Peter, Robert ; Saric, Iva ; Kavre Piltaver, Ivna ; Jelovica Badovinac, Ivana ; Petravic, Mladen

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, neobjavljeni rad, znanstveni

Skup
SIMS Europe 2016

Mjesto i datum
Münster, Njemačka, 18.09.2016. - 20.09.2016

Vrsta sudjelovanja
Poster

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
Titanium dioxide ; Atomic layer deposition ; SIMS ; Nitinol

Sažetak
Nitinol (NiTi), a nearly equiatomic alloy of Ni and Ti atoms, with its unique features such as shape memory, superelasticity and kink resistance, has found many applications in biomedical device production. However, the release of Ni from nitinol is of considerable concern, as Ni atoms are known to be allergenic and toxic. Therefore, modification and coating of NiTi is highly desirable in order to improve the biocompatibility and corrosion resistance of material and prevent the release of Ni into human body. Titanium dioxide (TiO2) is a perfect candidate for the biocompatible coatings on biomedical materials, due to its biological and chemical inertness, non-toxicity and long-term stability against corrosion. In this work we have used atomic layer deposition (ALD) technique for the synthesis of thin TiO2 films on NiTi substrates. Films were deposited in a wide temperature range (150 – 250 0C), using TiCl4 and water as ALD precursors. SIMS spectromety was employed for the investigation of Ni diffusion into TiO2, while the surface morpfology and the chemical composition of deposited films were analysed with SEM microscopy and XPS spectroscopy.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

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