Naslov
Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition

Autori
Šarić, Iva ; Peter, Robert ; Kavre Piltaver, Ivna ; Jelovica Badovinac, Ivana ; Salamon, Krešimir ; Petravić, Mladen

Izvornik
Thin solid films (0040-6090) 628 (2017); 142-147

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
Titanium dioxide ; Atomic layer deposition ; Residual chlorine ; Thin films ; Crystallization

Sažetak
We have studied the presence of residual chlorine in thin TiO2 films grown by plasma enhanced atomic layer deposition (PEALD) at temperatures within 40–250 °C range, using x-ray photoemission spectroscopy, secondary ion mass spectrometry, grazing incidence x-ray diffraction and scanning electron microscopy. The source of the residual chlorine is TiCl4, which was used as a titanium precursor in ALD. The PEALD results are compared with the results on ALD films grown thermally in the same reactor. Films deposited by PEALD show a lower amount of residual chlorine, while chlorine concentration decreases with the processing temperature in both ALD techniques. In addition to the standard signal from residual chlorine bonded to Ti, a strong signal from Cl-O bonds was observed in PEALD samples grown at low temperatures. Our study also shows the development of an anatase phase in TiO2 films grown above 200 °C, which correlates well with the reduction of both types of residual chlorine in PEALD samples.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

POVEZANOST RADA