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Pregled bibliografske jedinice broj: 82406

A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers


Suligoj, Tomislav; Wang, Kang Lung; Koričić, Marko; Biljanović, Petar
A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers // Proceedings of the ESSDERC 2002 / Baccarani, G.; Gnani, E.; Rudan, M. (ur.).
Bolonja: Alma Mater Studiorum Università di Bologna, 2002. str. 607-609 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)


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Naslov
A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers

Autori
Suligoj, Tomislav ; Wang, Kang Lung ; Koričić, Marko ; Biljanović, Petar

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of the ESSDERC 2002 / Baccarani, G.; Gnani, E.; Rudan, M. - Bolonja : Alma Mater Studiorum Università di Bologna, 2002, 607-609

Skup
32nd European Solid-State Device Research Conference

Mjesto i datum
Firenca, Italija, 24.09.2002. - 26.09.2002

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
lateral bipolar transistor; crystallographic dependent etching

Sažetak
A very compact Horizontal Current Bipolar Transistor (HCBT) is fabricated and tested. It is processed in <110> bulk Si substrate where the <111> crystal plane is perpendicular to the surface and is used as the active transistor sidewall. In this way, the sidewall roughness can be minimised by using crystallographic dependent etchants making the intrinsic transistor doping process highly controllable and repeatable. Hence, unlike in the existing lateral bipolar transistors, the optimum dopant contribution can be achieved what will improve transistors high-frequency performance. Additionally, HCBT is processed in simple technology with only 5 litography masks making this structure attractive for low-cost, low-power high-performance bipolar/BiCMOS applications. The improvement of f_T and f_max up to 24 and 50 GHz, respectively, can be achieved by using HCBT technology.

Izvorni jezik
Engleski

Znanstvena područja
Elektrotehnika



POVEZANOST RADA


Projekti:
0036001

Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb

Profili:

Avatar Url Petar Biljanović (autor)

Avatar Url Marko Koričić (autor)

Avatar Url Tomislav Suligoj (autor)


Citiraj ovu publikaciju:

Suligoj, Tomislav; Wang, Kang Lung; Koričić, Marko; Biljanović, Petar
A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers // Proceedings of the ESSDERC 2002 / Baccarani, G.; Gnani, E.; Rudan, M. (ur.).
Bolonja: Alma Mater Studiorum Università di Bologna, 2002. str. 607-609 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
Suligoj, T., Wang, K., Koričić, M. & Biljanović, P. (2002) A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers. U: Baccarani, G., Gnani, E. & Rudan, M. (ur.)Proceedings of the ESSDERC 2002.
@article{article, author = {Suligoj, Tomislav and Wang, Kang Lung and Kori\v{c}i\'{c}, Marko and Biljanovi\'{c}, Petar}, year = {2002}, pages = {607-609}, keywords = {lateral bipolar transistor, crystallographic dependent etching}, title = {A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers}, keyword = {lateral bipolar transistor, crystallographic dependent etching}, publisher = {Alma Mater Studiorum Universit\`{a} di Bologna}, publisherplace = {Firenca, Italija} }
@article{article, author = {Suligoj, Tomislav and Wang, Kang Lung and Kori\v{c}i\'{c}, Marko and Biljanovi\'{c}, Petar}, year = {2002}, pages = {607-609}, keywords = {lateral bipolar transistor, crystallographic dependent etching}, title = {A New Compact Horizontal Current Bipolar Transistor (HCBT) Fabricated in (110) Wafers}, keyword = {lateral bipolar transistor, crystallographic dependent etching}, publisher = {Alma Mater Studiorum Universit\`{a} di Bologna}, publisherplace = {Firenca, Italija} }




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