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Light induced defects in amorhous silicon thin films


Pivac, Branko; Pavlović, Mladen; Kovačević, Ivana; Etlinger, Božidar; Zulim, Ivan
Light induced defects in amorhous silicon thin films // JVC-9 9th Joint Vacuum Conference Final programme and book of abstracts / Leisch, M. ; Winkler, A. (ur.).
Graz: HTU GmbH, Graz University of Technology, 2002. str. 79-79 (poster, međunarodna recenzija, sažetak, znanstveni)


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Naslov
Light induced defects in amorhous silicon thin films

Autori
Pivac, Branko ; Pavlović, Mladen ; Kovačević, Ivana ; Etlinger, Božidar ; Zulim, Ivan

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

Izvornik
JVC-9 9th Joint Vacuum Conference Final programme and book of abstracts / Leisch, M. ; Winkler, A. - Graz : HTU GmbH, Graz University of Technology, 2002, 79-79

Skup
JVC-9 9th Joint Vacuum Conference

Mjesto i datum
Leibnitz, Austrija, 16.06.2002. - 20.06.2002

Vrsta sudjelovanja
Poster

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
light induced defects; amorphous silicon; thin films
(ight induced defects; amorphous silicon; thin films)

Sažetak
The effect of light soakink on a a-Si:H films is well known as Staebler-Wronski effect, though its complete mechanism is not clear yet. We have studied the effect of light soaking with UV, white and sub-gap light on intrinsic a-Si:H films, as well as the effect of thermal annealing in the dark. It is shown that the light soaking of the films in the air did not affect the hydrogen concentrationfrom Si-H bonds and at the same time oxidation of the films is observed. It means that oxygen incorporation was due to broken backbonds to Si-H which are very likely weak bonds. Moreover it is found that while subgap irradiation did not produce oxidation white and UV light did, while UV light caused even minor Si-H bonds breaking. Vacuum annealing at 100 C in the dark on the other hand caused hydrogen redistribution enhancing thus the Si-H bond concentrationand recovering the broken bonds.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Projekti:
0023004
0098020

Ustanove:
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Ivan Zulim (autor)

Avatar Url Branko Pivac (autor)

Avatar Url Božidar Etlinger (autor)

Avatar Url Mladen Pavlović (autor)

Avatar Url Ivana Capan (autor)


Citiraj ovu publikaciju:

Pivac, Branko; Pavlović, Mladen; Kovačević, Ivana; Etlinger, Božidar; Zulim, Ivan
Light induced defects in amorhous silicon thin films // JVC-9 9th Joint Vacuum Conference Final programme and book of abstracts / Leisch, M. ; Winkler, A. (ur.).
Graz: HTU GmbH, Graz University of Technology, 2002. str. 79-79 (poster, međunarodna recenzija, sažetak, znanstveni)
Pivac, B., Pavlović, M., Kovačević, I., Etlinger, B. & Zulim, I. (2002) Light induced defects in amorhous silicon thin films. U: Leisch, M. & Winkler, A. (ur.)JVC-9 9th Joint Vacuum Conference Final programme and book of abstracts.
@article{article, author = {Pivac, Branko and Pavlovi\'{c}, Mladen and Kova\v{c}evi\'{c}, Ivana and Etlinger, Bo\v{z}idar and Zulim, Ivan}, year = {2002}, pages = {79-79}, keywords = {light induced defects, amorphous silicon, thin films}, title = {Light induced defects in amorhous silicon thin films}, keyword = {light induced defects, amorphous silicon, thin films}, publisher = {HTU GmbH, Graz University of Technology}, publisherplace = {Leibnitz, Austrija} }
@article{article, author = {Pivac, Branko and Pavlovi\'{c}, Mladen and Kova\v{c}evi\'{c}, Ivana and Etlinger, Bo\v{z}idar and Zulim, Ivan}, year = {2002}, pages = {79-79}, keywords = {ight induced defects, amorphous silicon, thin films}, title = {Light induced defects in amorhous silicon thin films}, keyword = {ight induced defects, amorphous silicon, thin films}, publisher = {HTU GmbH, Graz University of Technology}, publisherplace = {Leibnitz, Austrija} }




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