Pregled bibliografske jedinice broj: 810286
Phase map, composition and resistivity of reactively magnetron sputtered and annealed Ta– N films
Phase map, composition and resistivity of reactively magnetron sputtered and annealed Ta– N films // Journal of physics. D, Applied physics, 49 (2016), 19; 195301-1 doi:10.1088/0022-3727/49/19/195301 (međunarodna recenzija, članak, znanstveni)
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Naslov
Phase map, composition and resistivity of reactively magnetron sputtered and annealed Ta– N films
Autori
Salamon, Krešimir ; Radić Nikola ; Bogdanović- Radović, Ivančica ; Očko, Miroslav
Izvornik
Journal of physics. D, Applied physics (0022-3727) 49
(2016), 19;
195301-1
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
tantalum nitride ; magnetron sputtering ; thermal annealing ; phase composition ; resistivity
Sažetak
Thin films of tantalum nitride (Ta–N) have been prepared by reactive magnetron deposition under various nitrogen partial pressures pN2=0-1 and subsequently annealed (Ta = 450–950 °C). The structure, density, composition and electrical resistivity of the prepared films were systematically investigated. A pN2-Ta phase map was constructed from the results of structural analysis. With increasing of pN2 from 0 to 0.2, a single-phase or two-phase mixture films of tetragonal Ta, Ta2N (Ta > 450 °C), eps-TaN (Ta > 850 °C), theta-TaN (Ta > 850 °C) and fcc delta-TaN are sequentially observed. For pN2 = 0.25–0.45, the as grown and annealed films exhibit delt-TaN structure. Amorphous films grown in the pN2 = 0.45–0.75 range crystallize as cubic Ta2N3 upon annealing at Ta > 650 °C or as delt-TaN at Ta > 850 °C. A cubic Ta2N3 is grown at highest pN2 (>0.85), which decomposes to delt-TaN at Ta > 850 °C. The N /Ta atomic ratio in the film linearly increases for pN2 = 0–0.5, ranging from 0 to 2.1, while the mass density monotonously decreases with pN2. Upon annealing, a part of N atoms outdiffuses from the films deposited at pN2 > 0.3. The electrical resistivity strongly depends on both pN2 and Ta. However, in the as grown and annealed delt-TaN films the resistivity was of the order of 100–1000 µOhmcm. In these films, a correlation between the resistivity and the average number of defects (Ta vacancies and N atom excess) is observed. Finally, the influence of thermally introduced oxygen on the films resistivity has been revealed.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut za fiziku, Zagreb,
Institut "Ruđer Bošković", Zagreb
Profili:
Ivančica Bogdanović Radović
(autor)
Nikola Radić
(autor)
Miroslav Očko
(autor)
Krešimir Salamon
(autor)
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus