Naslov
An intense XUV source at a wavelength of 13.5 nm from an ablative capillary discharge

Autori
Andreić, Željko ; Ellwi, Samir Shakir ; Pleslić Sanda ; Kunze, Hans-Joachim

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

Izvornik
The Thirteenth International Conference on Vacuum Ultraviolet Radiation Physics (VUV-XIII), July 23-27, 2001, Trieste (Italy), book of abstracts / - , 2001

Skup
The Thirteenth International Conference on Vacuum Ultraviolet Radiation Physics (VUV-XIII), July 23-27, 2001, Trieste (Italy)

Mjesto i datum
Trst, Italija, 23.07.2001. - 27.07.2001

Vrsta sudjelovanja
Poster

Vrsta recenzije
Međunarodna recenzija

Sažetak
Strong emissions of an XUV source at a wavelength of 13.5 nm are presented in this study. In particular this wavelength has attracted the attention of many scientists working in the field by being a good candidate for the development of EUV lithography. One of the main reasons for this interest is due to the speedy development of multilayer mirrors such as the Mo/Si which has a reflectivity of 69.5 % at a wavelength of 13.5 nm [1]. This source was generated by using an ablative capillary discharge where the capillary was made of PVC (polyvinyl chloride). A remarkable burst of radiation at the above mentioned wavelength was recorded. Figure 1 shows time resolved spectra of a capillary made of POM (polyacetal) in comparison to the one made of PVC. This figure shows clearly that the intensity of the radiation is higher by a factor of 10, in the spectral region of interest, when the capillary is made of PVC in comparison to that of POM. These spectra were recorded using a flat field spectrograph (grating 1200 line/mm) combined with a MCP whose phosphorous was imaged onto a CCD camera. Figure 1: Time resolved spectra for PVC and POM capillaries at 70 ns from the beginning of the discharge. [1] Louis E. et . al . SPIE, pp 3997-44 (2000).

Izvorni jezik
Engleski

Znanstvena područja
Fizika

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