Pregled bibliografske jedinice broj: 737404
Preparation and structure of CU-W thin films
Preparation and structure of CU-W thin films // Thin solid films, 228 (1993), 1-2; 225-228 doi:10.1016/0040-6090(93)90604-N (međunarodna recenzija, članak, znanstveni)
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Naslov
Preparation and structure of CU-W thin films
Autori
Radić, Nikola ; Gržeta, Biserka ; Gracin, Davor ; Car, Tihomir
Izvornik
Thin solid films (0040-6090) 228
(1993), 1-2;
225-228
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
amorphous thin films ; magnetron sputtering
Sažetak
Amorphous thin films of Cu-W alloys have been prepared by a co-deposition sputtering technique in the composition range from Cu75W25 to Cu34W66. The crystallization of Cu50W50 and Cu66W34 amorphous samples started at about 420 K with the appearance of pure Cu. At about 670 K, metastable b.c.c. solid solution W(Cu) appeared and, at 1100 K, this started to decompose and pure W separated. However, the amorphous phase did not completely disappear, even at 1000 K.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut "Ruđer Bošković", Zagreb
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
