Pregled bibliografske jedinice broj: 68243
Structural properties of a-Si1-xCx:H by saxs and ir spectroscopy
Structural properties of a-Si1-xCx:H by saxs and ir spectroscopy // Extended abstracts of 7th Joint Vacum Conference of Hungary, Austria, Croatia and Slovenia / Bohatka, Sandor (ur.).
Deberecen: Kossuth L. University, 1997. str. 207-208 (poster, međunarodna recenzija, sažetak, znanstveni)
CROSBI ID: 68243 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Structural properties of a-Si1-xCx:H by saxs and ir spectroscopy
Autori
Gracin, Davor ; Dubček, Pavo
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
Extended abstracts of 7th Joint Vacum Conference of Hungary, Austria, Croatia and Slovenia
/ Bohatka, Sandor - Deberecen : Kossuth L. University, 1997, 207-208
Skup
7th Joint Vacum Conference of Hungary, Austria, Croatia and Slovenia
Mjesto i datum
Debrecen, Mađarska, 26.05.1997. - 29.05.1997
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
FTIR spectroscopy; SAXS; amorphous silicon carbide
Sažetak
The a-Si1-xCx :H thin films were deposited by means of DC magnetron sputtering source, using benzene vapour as a origin of carbon atoms. The specimens were analysed by SAXS (Small Angle X- ray Scattering) and IR spectroscopy, as a function of carbon concentration, up to x=0.3. The incorporation of carbon atoms in a-Si:H results in usually appearance of absorption related to Si-C and C-H bonds. The integrated absorption related to Si-H bonds remains near the same, while stretching frequency of this bonds shifts towards the higher values. This, frequency related changes are discussed as a consequence of increasing in void volume ratio and/or void volume per each Si-H oscilator. The SAXS data of pure a-Si:H indicates structural units with giro radius, RG =12, 7 A which increases with cabon content up to 20, 5 A, for x=0, 2 and decreases to 17, 3 A for x=0, 3. This structural units are atributed to the clusters of small voids with dimensions of several silicon vacancies.
Izvorni jezik
Engleski
Znanstvena područja
Fizika