Pretraga

Pretražite po imenu i prezimenu autora, mentora, urednika, prevoditelja

Napredna pretraga

Pregled bibliografske jedinice broj: 652529

Diffusion enhancement in thin films due to low energy ion bombardment during deposition

Sternberg, Z.; Stupnišek, Mladen; Dukić, Predrag; Stubičar, Mirko; Milat, Ognjen
Diffusion enhancement in thin films due to low energy ion bombardment during deposition // Vacuum, 40 (1990), 1-2; 234-234 doi:10.1016/0042-207X(90)90209-H (međunarodna recenzija, članak, znanstveni)

CROSBI ID: 652529 Za ispravke kontaktirajte CROSBI podršku putem web obrasca

Naslov
Diffusion enhancement in thin films due to low energy ion bombardment during deposition

Autori
Sternberg, Z. ; Stupnišek, Mladen ; Dukić, Predrag ; Stubičar, Mirko ; Milat, Ognjen

Izvornik
Vacuum (0042-207X) 40 (1990), 1-2; 234-234

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
diffusion; boundary layer effects

Sažetak
Sputter deposition of cupper on alumunium, under bombardment of low-energy ions resulted in the formation of two interfacial zones. Results suggest that by supplying energy for the formation of vacancies, the activation energy for diffusion can be reduced.

Izvorni jezik
Engleski

Znanstvena područja
Strojarstvo

Napomena
Jedan od odabranih radova prezentiranih na Yugoslav-Austrian-Hungarian Fourth Joint Vacuum Conference.



POVEZANOST RADA

Profili:

Avatar Url Ognjen Milat (autor)

Avatar Url Mirko Stubičar (autor)

Avatar Url Predrag Dukić (autor)

Avatar Url Mladen Stupnišek (autor)

Poveznice na cjeloviti tekst rada:

doi www.sciencedirect.com dx.doi.org

Citiraj ovu publikaciju:

Sternberg, Z.; Stupnišek, Mladen; Dukić, Predrag; Stubičar, Mirko; Milat, Ognjen
Diffusion enhancement in thin films due to low energy ion bombardment during deposition // Vacuum, 40 (1990), 1-2; 234-234 doi:10.1016/0042-207X(90)90209-H (međunarodna recenzija, članak, znanstveni)
Sternberg, Z., Stupnišek, M., Dukić, P., Stubičar, M. & Milat, O. (1990) Diffusion enhancement in thin films due to low energy ion bombardment during deposition. Vacuum, 40 (1-2), 234-234 doi:10.1016/0042-207X(90)90209-H.
@article{article, author = {Sternberg, Z. and Stupni\v{s}ek, Mladen and Duki\'{c}, Predrag and Stubi\v{c}ar, Mirko and Milat, Ognjen}, year = {1990}, pages = {234-234}, DOI = {10.1016/0042-207X(90)90209-H}, keywords = {diffusion, boundary layer effects}, journal = {Vacuum}, doi = {10.1016/0042-207X(90)90209-H}, volume = {40}, number = {1-2}, issn = {0042-207X}, title = {Diffusion enhancement in thin films due to low energy ion bombardment during deposition}, keyword = {diffusion, boundary layer effects} }
@article{article, author = {Sternberg, Z. and Stupni\v{s}ek, Mladen and Duki\'{c}, Predrag and Stubi\v{c}ar, Mirko and Milat, Ognjen}, year = {1990}, pages = {234-234}, DOI = {10.1016/0042-207X(90)90209-H}, keywords = {diffusion, boundary layer effects}, journal = {Vacuum}, doi = {10.1016/0042-207X(90)90209-H}, volume = {40}, number = {1-2}, issn = {0042-207X}, title = {Diffusion enhancement in thin films due to low energy ion bombardment during deposition}, keyword = {diffusion, boundary layer effects} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus

Citati:

    Altmetrijski pokazatelji:


    Podijeli:





    Contrast
    Increase Font
    Decrease Font
    Dyslexic Font
    CROSBI koristi kolačiće (cookies) kako bi poboljšao funkcionalnost stranice.