Pregled bibliografske jedinice broj: 605981
Relaxation-crystallization processes in Al-TE binary amorphous thin films
Relaxation-crystallization processes in Al-TE binary amorphous thin films // 14th Joint Vacuum Conference / 12th European Vacuum Conference / 11th Annual Meeting of the German Vacuum Society / 19th Croatian-Slovenian Vacuum Meeting : Programme and book of abstracts / Radić, Nikola ; Milošević, Slobodan (ur.).
Zagreb: Hrvatsko Vakuumsko Društvo (HVD), 2012. str. 69-69 (poster, međunarodna recenzija, sažetak, znanstveni)
CROSBI ID: 605981 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Relaxation-crystallization processes in Al-TE binary amorphous thin films
Autori
Jerčinović, Marko ; Car, Tihomir ; Radić, Nikola ; Ivkov, Jovica
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
14th Joint Vacuum Conference / 12th European Vacuum Conference / 11th Annual Meeting of the German Vacuum Society / 19th Croatian-Slovenian Vacuum Meeting : Programme and book of abstracts
/ Radić, Nikola ; Milošević, Slobodan - Zagreb : Hrvatsko Vakuumsko Društvo (HVD), 2012, 69-69
ISBN
978-953-98154-1-5
Skup
Vacuum Conference (14 ; 2012) ; European Vacuum Conference (12 ; 2012) ; Annual Meeting of the German Vacuum Society (11 ; 2012) ; Croatian-Slovenian Vacuum Meeting (19 ; 2012)
Mjesto i datum
Dubrovnik, Hrvatska, 04.06.2012. - 08.06.2012
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
Al-TE amorphous alloys; thin films; relaxation; crystallization
Sažetak
Structural relaxation and crystallization of Al-TE amorphous thin films under isochronal and isothermal condition was examined by continuous in situ electrical resistance measurements in vacuum. The amorphous Al-TE thin films were prepared by simultaneous sputtering from two independently controlled DC magnetron sources. For the isochronal heating, it was observed that the relaxation effects decreased with an increase of the heating rate and decreased with the content of early transition metal in the film. Assuming the linear dependence of resistivity with temperature (R/RRT ~ α*ΔT) in the observed temperature interval, the relaxation effects were extracted from the R(T) dependence. Adaptations of the JMA model to non-isothermal kinetics were used to explain the relaxation behavior. The application of the models suggests that the resistivity is influenced by competition of two effects inside the film: changing from amorphous to crystalline structure and forming of grain boundaries.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Projekti:
098-0982886-2895 - Novi amorfni i nanostrukturirani tankoslojni materijali (Radić, Nikola, MZOS ) ( CroRIS)
Ustanove:
Institut za fiziku, Zagreb,
Institut "Ruđer Bošković", Zagreb