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Pregled bibliografske jedinice broj: 588449

Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma

Grulich, Ondrej; Kregar, Zlatko; Modic, Martina; Vesel, Alenka; Cvelbar, Uroš; Mraček, Aleš; Ponizil, Petr
Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma // Plasma chemistry and plasma processing, 32 (2012), 5; 1075-1091 doi:10.1007/s11090-012-9387-7 (međunarodna recenzija, članak, znanstveni)

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Naslov
Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma

Autori
Grulich, Ondrej ; Kregar, Zlatko ; Modic, Martina ; Vesel, Alenka ; Cvelbar, Uroš ; Mraček, Aleš ; Ponizil, Petr

Izvornik
Plasma chemistry and plasma processing (0272-4324) 32 (2012), 5; 1075-1091

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
hyaluronan;  surface modification;  surface treatment;  low-temperature plasma;  XPS

Sažetak
Surface of sodium hyaluronate films was modified in the inductively coupled low temperature ammonia plasma. The amount of bonded nitrogen was measured by the XPS method. The optical emission and temperature of the sample surface were measured during sample processing. Increased processing time and increased discharge power caused a rise of nitrogen concentration on the surface of hyaluronan films, though this effect is limited due to surface saturation and sample destruction at elevated discharge power.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA

Projekti:
035-0352851-2856 - Laserska spektroskopija hladne plazme za obradu materijala (Milošević, Slobodan, MZOS ) ( CroRIS)

Ustanove:
Institut za fiziku, Zagreb

Profili:

Avatar Url Zlatko Kregar (autor)

Poveznice na cjeloviti tekst rada:

doi www.springerlink.com

Citiraj ovu publikaciju:

Grulich, Ondrej; Kregar, Zlatko; Modic, Martina; Vesel, Alenka; Cvelbar, Uroš; Mraček, Aleš; Ponizil, Petr
Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma // Plasma chemistry and plasma processing, 32 (2012), 5; 1075-1091 doi:10.1007/s11090-012-9387-7 (međunarodna recenzija, članak, znanstveni)
Grulich, O., Kregar, Z., Modic, M., Vesel, A., Cvelbar, U., Mraček, A. & Ponizil, P. (2012) Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma. Plasma chemistry and plasma processing, 32 (5), 1075-1091 doi:10.1007/s11090-012-9387-7.
@article{article, author = {Grulich, Ondrej and Kregar, Zlatko and Modic, Martina and Vesel, Alenka and Cvelbar, Uro\v{s} and Mra\v{c}ek, Ale\v{s} and Ponizil, Petr}, year = {2012}, pages = {1075-1091}, DOI = {10.1007/s11090-012-9387-7}, keywords = {hyaluronan,  surface modification,  surface treatment,  low-temperature plasma,  XPS}, journal = {Plasma chemistry and plasma processing}, doi = {10.1007/s11090-012-9387-7}, volume = {32}, number = {5}, issn = {0272-4324}, title = {Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma}, keyword = {hyaluronan,  surface modification,  surface treatment,  low-temperature plasma,  XPS} }
@article{article, author = {Grulich, Ondrej and Kregar, Zlatko and Modic, Martina and Vesel, Alenka and Cvelbar, Uro\v{s} and Mra\v{c}ek, Ale\v{s} and Ponizil, Petr}, year = {2012}, pages = {1075-1091}, DOI = {10.1007/s11090-012-9387-7}, keywords = {hyaluronan,  surface modification,  surface treatment,  low-temperature plasma,  XPS}, journal = {Plasma chemistry and plasma processing}, doi = {10.1007/s11090-012-9387-7}, volume = {32}, number = {5}, issn = {0272-4324}, title = {Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma}, keyword = {hyaluronan,  surface modification,  surface treatment,  low-temperature plasma,  XPS} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus

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