Naslov
Nanoscale multilayers as optical elements for X-ray photolitography

Autori
Radić, Nikola ; Salamon, Krešimir ; Dubček, Pavo ; Milat, Ognjen ; Jerčinović, Marko ; Dražić, Goran ; Bernstorff, Sigrid

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
MIPRO 2011 - 34th International Convention on Information and Communication Technology, Electronics and Microelectronics - Proceedings / Ivanda, Mile - Zagreb : Hrvatska udruga za informacijsku i komunikacijsku tehnologiju, elektroniku i mikroelektroniku - MIPRO, 2011, 27-30

ISBN
978-1-4577-0996-8

Skup
MIPRO 2011 - 34th International Convention on Information and Communication Technology, Electronics and Microelectronics

Mjesto i datum
Opatija, Hrvatska, 23.05.2011. - 27.05.2011

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
Gi-SAXS; Hard X ray; Nanoscale multilayers; Photolithographic process; X ray reflectivity

Sažetak
The development of ever smaller electronic components by using a photolithographic process is limited by the wavelength of light. For the EUV and X-ray ranges the artificial multilayer coatings in the nanometer range are used as optical elements. From the viewpoint of both technology and optical properties, the tungsten/carbon combination is one of the best for X-ray radiation. In this work we have examined the effects of periodicity, tungsten phase composition, and number of W/C bilayers upon the reflectivity of hard X-rays. The W/C multilayers have been prepared by sequential RF/DC magnetron sputtering and characterized by GISAXS, TEM, and X-ray reflectivity methods.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

POVEZANOST RADA