Pregled bibliografske jedinice broj: 499125
Conduction processes in the Ta(-)/Ta2O5-electrolyte system
Conduction processes in the Ta(-)/Ta2O5-electrolyte system // Thin solid films, 145 (1986), 1; 39-49 doi:10.1016/0040-6090(86)90249-X (međunarodna recenzija, članak, znanstveni)
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Naslov
Conduction processes in the Ta(-)/Ta2O5-electrolyte system
Autori
Metikoš-Huković, Mirjana ; Ceraj-Cerić, Mihajlo
Izvornik
Thin solid films (0040-6090) 145
(1986), 1;
39-49
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Ta2O5; phosphate buffer; semiconducting properties
Sažetak
Thin tantalum oxide (Ta2O5) films of controlled thickness d (from 1 to 80 nm) were obtained by the anodization of tantalum in a phosphate buffer at pH 7. Experimental results for the d.c. conduction characteristics of amorphous highly imperfect Ta2O5 films are presented. Semiquantitative agreement is observed between the experiment and theory. For electrodes covered with very thin films, direct electron exchange between the metal and the electrolyte predominates. In the high field region, for films thicker than 30 nm, the conduction mechanism is space charge limited. The effective electron mobility is 10-13 m2 V-1 s-1 for ε = 13. In the low field region, the data can best be interpreted in terms of an ohmic mechanism with a resistivity of approximately 5 × 1014 Ω cm. The band gap for these films was determined from the spectral distribution of the photoconductivity and amounts to 4 eV. The flat-band potential is approximately - 1 V vs. the Ag/AgCl electrode.
Izvorni jezik
Engleski
Znanstvena područja
Kemija
POVEZANOST RADA
Ustanove:
Fakultet kemijskog inženjerstva i tehnologije, Zagreb
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus