Naslov
Characterization of amorphous boron layers as diffusion barrier for pure aluminium

Autori
Šakić, Agata ; Jovanović, Vladimir ; Maleki, Parastoo ; Scholtes, Tom L.M. ; Milosavljević, Silvana ; Nanver, Lis K.

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of the 33rd International Convention MIPRO - Vol I. MEET and GVS / Biljanović, Petar ; Skala, Karolj - Zagreb : Denona, 2010, 26-29

ISBN
978-953-233-051-9

Skup
33rd International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO)

Mjesto i datum
Opatija, Hrvatska, 24.05.2010. - 28.05.2010

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
boron layer; Al spiking

Sažetak
A deposited boron layer is investigated as a diffusion barrier between Al and Si. The doping reaction of diborane B2H6 on Si(100) substrates forms an ultra-shallow p+-doped region and amorphous boron layer, the barrier properties of which are tested at different thicknesses. Experimental data obtained from extensive microscopy analyses are used to asses the topography and chemical properties of the silicon/boron surface when in contact with pure aluminium. In this study it is demonstrated that the normally observed spiking behaviour of Al on Si can be prevented and a perfect, spike- and precipitate-free interface can be achieved.

Izvorni jezik
Engleski

Znanstvena područja
Elektrotehnika

POVEZANOST RADA