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Pregled bibliografske jedinice broj: 439679

Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility


Poljak, Mirko; Jovanović, Vladimir; Suligoj, Tomislav
Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility // Proceedings of the International Semiconductor Device Research Symposium 2009 / Jones, Ken ; Dilli, Zeynep (ur.).
College Park (MD): Institute of Electrical and Electronics Engineers (IEEE), 2009. str. 1-2 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)


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Naslov
Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility

Autori
Poljak, Mirko ; Jovanović, Vladimir ; Suligoj, Tomislav

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of the International Semiconductor Device Research Symposium 2009 / Jones, Ken ; Dilli, Zeynep - College Park (MD) : Institute of Electrical and Electronics Engineers (IEEE), 2009, 1-2

ISBN
978-1-4244-6031-1

Skup
International Semiconductor Device Research Symposium 2009

Mjesto i datum
College Park (MD), Sjedinjene Američke Države, 09.12.2009. - 11.12.2009

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
quantum modeling; phonon scattering; mobility; ultra-thin body; double-gate MOSFET

Sažetak
For the first time, mobility enhancement due to quantum confinement effects is reported in (111)-oriented UTB DG MOSFETs with TSi between 6 and 8 nm for Eeff of 1 and 0.3 MV/cm, respectively. When compared to (100)- and (110)-oriented UTB DG devices, (111)-devices reach maximum mobility at higher TSi which benefits the fabrication and makes them less susceptible to δTSi-induced scattering. The results presented here encourage the utilization of UTB FinFETs on (110)-substrate with (111)-oriented vertical sides.

Izvorni jezik
Engleski

Znanstvena područja
Elektrotehnika



POVEZANOST RADA


Projekti:
036-0361566-1567 - Nanometarski elektronički elementi i sklopovske primjene (Suligoj, Tomislav, MZO ) ( CroRIS)
036-0982904-1642 - Sofisticirane poluvodičke strukture za komunikacijsku tehnologiju (Koričić, Marko, MZO ) ( CroRIS)

Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb

Profili:

Avatar Url Tomislav Suligoj (autor)

Avatar Url Vladimir Jovanović (autor)

Avatar Url Mirko Poljak (autor)


Citiraj ovu publikaciju:

Poljak, Mirko; Jovanović, Vladimir; Suligoj, Tomislav
Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility // Proceedings of the International Semiconductor Device Research Symposium 2009 / Jones, Ken ; Dilli, Zeynep (ur.).
College Park (MD): Institute of Electrical and Electronics Engineers (IEEE), 2009. str. 1-2 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
Poljak, M., Jovanović, V. & Suligoj, T. (2009) Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility. U: Jones, K. & Dilli, Z. (ur.)Proceedings of the International Semiconductor Device Research Symposium 2009.
@article{article, author = {Poljak, Mirko and Jovanovi\'{c}, Vladimir and Suligoj, Tomislav}, year = {2009}, pages = {1-2}, keywords = {quantum modeling, phonon scattering, mobility, ultra-thin body, double-gate MOSFET}, isbn = {978-1-4244-6031-1}, title = {Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility}, keyword = {quantum modeling, phonon scattering, mobility, ultra-thin body, double-gate MOSFET}, publisher = {Institute of Electrical and Electronics Engineers (IEEE)}, publisherplace = {College Park (MD), Sjedinjene Ameri\v{c}ke Dr\v{z}ave} }
@article{article, author = {Poljak, Mirko and Jovanovi\'{c}, Vladimir and Suligoj, Tomislav}, year = {2009}, pages = {1-2}, keywords = {quantum modeling, phonon scattering, mobility, ultra-thin body, double-gate MOSFET}, isbn = {978-1-4244-6031-1}, title = {Optimum Body Thickness of (111)-oriented Ultra-Thin Body Double-Gate MOSFETs with Respect to Quantum-Calculated Phonon-Limited Mobility}, keyword = {quantum modeling, phonon scattering, mobility, ultra-thin body, double-gate MOSFET}, publisher = {Institute of Electrical and Electronics Engineers (IEEE)}, publisherplace = {College Park (MD), Sjedinjene Ameri\v{c}ke Dr\v{z}ave} }




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