Pregled bibliografske jedinice broj: 36606
Quantitative analysis of a-Si_1-xC_x:H thin films
Quantitative analysis of a-Si_1-xC_x:H thin films // Applied surface science, 145 (1999), 188-191 doi:10.1016/S0169-4332(98)00795-8 (međunarodna recenzija, članak, znanstveni)
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Naslov
Quantitative analysis of a-Si_1-xC_x:H thin films
Autori
Gracin, Davor ; Jakšić, Milko ; Yang, C. ; Borjanović, Vesna ; Praček, Borut
Izvornik
Applied surface science (0169-4332) 145
(1999);
188-191
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
a-Si_1-xC_x:H thin films
Sažetak
The composition of a-Si_1-xC_x:H films, deposited by magnetron sputtering, was measured by AES (Auger Electron Spectrometry), RBS (Rutherford Backscattering Spectrometry) using both, protons and alpha particles, ERDA (Elastic Recoil Detection Analysis) and FTIR spectrometry. The results obtained by all three methods show agreement in C_c/C_Si ratio within the experimental error. However, the AES somewhat underestimates the silicon concentrations, which is discussed as a consequence of chemical bonding and matrix effects. The hydrogen concentrations obtained by ERDA are typically about 30% higher than those estimated by FTIR, possibly due to the presence of non-bonded hydrogen in the film.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb,
Institut "Ruđer Bošković", Zagreb
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus