Naslov
Nanoporous TiO2 capping layer for transparent conductive electrodes

Autori
Ristova, Mimoza M ; Nasov, Ilija ; Gracin, Davor ; Milun, Milan ; Juraić, Krunoslav ; Kostadinova, Hristina ; Smilkov, Svetislav

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

Izvornik
New frontiers of low-cost photovoltaic solar cells 2008 - Abstract Book / - Skopje, 2008, 40-40

ISBN
978-9989-2870-0-8

Skup
New frontiers of low-cost photovoltaic solar cells 2008 - Workshop

Mjesto i datum
Skopje, Sjeverna Makedonija, 29.05.2008. - 31.05.2008

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Nije recenziran

Ključne riječi
Titanium dioxide; capping layer; TCO; hydrogen plasma

Sažetak
Titanium dioxide thin films were deposited by PVD arc evaporation from Ti target in an oxygen atmospher onto (a) fluorine doped tin oxide substrate (FTO) and (b) microscopic glass slides. The growth rate was calculated from the film thickness profilometry measurements versus the deposition time. The X-ray photoemission spectroscopy analysis the Ti2p binding energy electron shift, suggested TiO2 stoichiometric compound. The films were highly transparent for the visible light with a transmittance of about 85% for the film of 1 micron thickness. The results for the RMS surface roughness of the films deposited onto FTO substrate (RMS ~ 9 nm) evaluated from the atomic force microscopy (AFM) analysis suggested on nanoporous structures. Regardless of the low conductivity the TiO2 films, their nanoporosity allowed application of a nano TiOx layer as a top capping layer onto FTO films. The sheet resistance of the nano TiO2/FTO double layer was studied as a function of the TiO2 thickness. The layers were exposed to hydrogen plasma and the change in the transmittance and the sheet resistance were discussed.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

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