Pregled bibliografske jedinice broj: 256705
Growth of Ge islands on Si substrates
Growth of Ge islands on Si substrates // Thin solid films, 515 (2006), 2; 752-755 doi:10.1016/j.tsf.2005.12.198 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 256705 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Growth of Ge islands on Si substrates
Autori
Radić, Nikola ; Pivac, Branko ; Dubček, Pavo ; Kovačević, Ivana ; Bernstorff, Sigrid ;
Izvornik
Thin solid films (0040-6090) 515
(2006), 2;
752-755
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Ge nanostructures ; small angle X-ray scattering ; atomic force microscopy
Sažetak
We present a study of Ge islands formation on Si(100) substrates using grazing-incidence small-angle X-ray scattering (GISAXS) and atomic force microscopy. Samples were prepared by magnetron sputtering of a 5 nm thick Ge layer in a very high-vacuum on Si(100) substrate held at different temperatures. The vertical cut (perpendicular to the surface) of the experimental 2D GISAXS pattern has been fitted using a Guinier approximation. The optimum temperature for the islands formation was 650°C. At this temperature islands grow in conical shape with very similar dimensions, however, inter-island distances varied significantly.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut "Ruđer Bošković", Zagreb
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus