Pregled bibliografske jedinice broj: 20569
Nucleation and growth of anodic oxide films on bismuth
Nucleation and growth of anodic oxide films on bismuth // Electrochimica acta, 43 (1998), 3175-3181 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 20569 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Nucleation and growth of anodic oxide films on bismuth
Autori
Grubač, Zoran ; Metikoš-Huković, Mirjana
Izvornik
Electrochimica acta (0013-4686) 43
(1998);
3175-3181
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
nucleation; oxide films; bismuth; potentiostatic transients; cyclic voltammetry
Sažetak
Combined voltammetry and potentiostatic transient techniques have been used to study nucleation, formation and growth of thin oxide films on high purity polycrystalline bismuth in a borate buffer solution, pH = 9.2. It was shown that the initial step in the formation of the continuos anodic layer of bismuth oxide on bismuth is a nucleation process. The potentiostatic technique was a valuable tool in its study. The oxide film nucleation kinetics were explained reasonably well through a 3D progressive nucleation and growth mechanism under diffusion controlled growth. Nucleation potential, steady-state nucleation rate and the number density of growing centres are determined. A detailed mechanistic interpretation of the nucleation process and thickening of the anodic layer under potentiodynamic conditions was obtained using the criteria of cyclic voltammetry.
Izvorni jezik
Engleski
Znanstvena područja
Kemija
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus