Pregled bibliografske jedinice broj: 199185
Characteristics of 30 nm Long Vertical Silicon-on-Nothing (SON) MOSFET
Characteristics of 30 nm Long Vertical Silicon-on-Nothing (SON) MOSFET // Proceedings of MIPRO 2005
Opatija, Hrvatska, 2005. (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
CROSBI ID: 199185 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Characteristics of 30 nm Long Vertical Silicon-on-Nothing (SON) MOSFET
Autori
Jovanović, Vladimir ; Suligoj, Tomislav ; Schulze, Joerg ; Eisele, Ignaz ; Jernigan, Glenn ; Thompson, Phill E.
Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni
Izvornik
Proceedings of MIPRO 2005
/ - , 2005
Skup
MIPRO 2005 International Conference
Mjesto i datum
Opatija, Hrvatska, 30.05.2005. - 03.06.2005
Vrsta sudjelovanja
Predavanje
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
vertical MOSFET; silicon on nothing; short channel effects
Sažetak
The Vertical Fully Depleted Silicon-on-Nothing (VFDSONFET), the existing Silicon-on-Nothing (SON) MOSFET and the bulk-Si MOSFET with 30 nm long hannels are compared using the two dimensional device simulator. The VFDSONFET is shown to have the best subthreshold characteristics because of the absence of the silicon substrate. The further scaling of the VFDSONFET gate oxide is examined, showing improvement in the device performance. The current manufacturing process of the VFDSONFET results in deep source and drain regions. It is shown that this increase in depth has small influence on drain- nduced barrier lowering and negligible effects on other characteristics. The possible modification of the VFDSONFET buried oxide confirms the importance of using thin, low-k dielectric for the buried oxide.
Izvorni jezik
Engleski
Znanstvena područja
Elektrotehnika