Naslov
Al-W amorphous thin films

Autori
Radić, Nikola ; Car, Tihomir ; Tonejc, Antun ; Ivkov, Jovica ; Stubičar, Mirko ; Metikoš-Huković, MIrjana

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Physics and Technology of Thin Films / Moshfegh, A.Z. ; Kaenel, H.v., Kashyap, S.C. ; Wuttig, M. - Singapur : World Scientific Publishing, 2004, 101-118

Skup
Internationa Workshop on Physics and Technology of Thin Films

Mjesto i datum
Teheran, Iran, 22.02.2003. - 06.03.2003

Vrsta sudjelovanja
Pozvano predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
aluminum; tungsten; magnetron sputtering; amorphous; thin films

Sažetak
Completely amorphous Al-W thin films were prepared by magnetron codeposition in the Al82W18 - Al63W37 composition range. Thermal stability of the amorphous films was investigated by the continuous in situ electric resistance measurements up to 720°C, and a prolonged annealing in vacuum at high subcrystallization temperatures. The change in film structure caused by isochronal and isothermal heat treatments was determined by the XRD method. The crystallization temperatures were determined within a whole compositional range of amorphicity. A pronounced structural relaxation of the Al-W amorphous films was attributed to specific electronic structure of aluminum. Mechanical properties of the Al-W thin films were improved, while corrosive properties in a very aggressive environments and in the presence of aggressive Cl- anions became only slightly degraded upon crystallization of the amorphous Al-W thin films.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

POVEZANOST RADA