Naslov
Comparison Between CVD and ALE Produced TiO2 Cathodes in Zn/(PEO)4ZnCl2/TiO2, SnO2 or ITO Galvanic Cells

Autori
Turković, Aleksandra ; Drašner, Antun ; Šokčević, Damir ; Raiala, Mikka ; Asikainen, T., Leskela, Markku

Izvornik
Journal de physique. IV (1155-4339) 5 (1995); 1133-1139

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
CVD; ALE; TiO2; galvanic cell

Sažetak
The way of preparation of thin films of TiO2 is extremely important regarding its application in electronic and optoelectronic devices. We have assembled Zn/(PEO)4ZnCl2/TiO2, SnO2 or ITO rechargeable galvanic cells using CVD (chemical vapour deposition) or ALE ( atomic layer epitaxy) producing TiO2 cathodes. The charge-discharge cycles were measured with a constant current in the range of 10-6 to 10-5 A for different cells. It was shown that CVD prepared TiO2 cathode is increasing capacity of the cell by allowing higher constant currents to be applied to the cell. The complex impedance measurements of the electrolyte (PEO)4ZnCl2 have been performed in the range of 1 Hz to 1 MHz and in the temperature range from 290 to 400 K by appling Zn or Sn electrodes.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

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