Naslov
UV and Infrared studies of TiO2 Thin Film Cathodes in Ag/AgI/TiO2, SnO2 Photosensitive Galvanic Cells

Autori
Turković, Aleksandra ; Radić, Nikola ; Šokčević, Damir

Izvornik
Materials science & engineering. B, Solid-state materials for advanced technology (0921-5107) 23 (1994); 41-47

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
UV; FTIR; Titanium dioxide; thin film

Sažetak
Thin polycrystalline films of TiO2 were deposited by the chemical vapour deposition and spray method. Photoresistance-wavelength dependence and absorption in the range from 250 to 600 nm were determined. After process of applying AgI to TiO2 thin films, the absorption maxima was shifted from 280 to 430 nm. The shift from ultraviolet to visible region has induced photosensitive behaviour of our cells. Occurence of impurities in thin films was checked in the wavenumber range from 2000 - 4000 cm-1 with FTIR (Fourier transform infrared spectroscopy). It has shown that C impurity at the surface forms a chemical bonds with atoms of TiO2 substrate as well as with H2 from surrounding atmosphere.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

POVEZANOST RADA