Naslov
Dust Particle Formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin-film deposition

Autori
Berndt, Johannes ; Hong, Suk-Ho ; Kovačević, Eva ; Stefanović , Ilija ; Winter Jörg

Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni

Skup
Symposium on Plasma Surface Engineering at the Spring Meeting of the German Physical Society

Mjesto i datum
Regensburg, Njemačka, 11.03.2002. - 15.03.2002

Vrsta sudjelovanja
Pozvano predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
plasma; thin-films; killer particulates

Sažetak
Low pressure RF reactive plasmas are used widely for thin-film deposition. deposition of thin-films obtained from hydrocarbon precursors is specially interesting in the field of biomedicine and optical industry, but the problem in the production of the films is byproduct of polymerization: dust particles. It could be produceed trough homogenious growth (spontaneous polymerization) or heterogenious growth (sputtering of the films produced on the chamber wals). It is important to understand the processes of dust formation to either eliminate them, or use them for so called dust embeding in the thin films, that result in specially mechanically resistent films.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

POVEZANOST RADA