Naslov
Study of silicon plasma produced by nitrogen laser

Autori
Pleslić, Sanda ; Andreić, Željko

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Conference proceedings ICECom 2003 / 17th International Conference on Applied Electromagnetics and Communications / Bonefačić, Davor - Zagreb : Hrvatsko društvo za komunikacije, računarstvo, elektroniku, mjerenja I automatiku (KoREMA), 2003, 286-289

Skup
ICECom 2003 / 17th International Conference on Applied Electromagnetics and Communications

Mjesto i datum
Dubrovnik, Hrvatska, 01.10.2003. - 03.10.2003

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
Plasma; Laser; Silicon

Sažetak
Experimental investigation of laser-produced plasma of silicon is described in this work. Plasma was produced by nanosecond (6 ns) nitrogen laser pulses (337.1 nm) with maximal energy density of about 1.1 J/cm2 and studied by UV-VIS spectroscopy. Electron density of the order of magnitude of 1018 cm-3 and electron temperature of about 1.5 eV were achieved in produced plasma. Numerical modelling of target heating predicts 4-5 times higher electron temperature than experimentally determined ones. The optical depth of particular material is main parameter for plasma production.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

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