Naslov
Microhardness properties of Cu-W amorphous thin films

Autori
Radić, Nikola ; Stubičar, Mirko

Izvornik
Journal of materials science (0022-2461) 33 (1998), 13; 3401-3405

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
amorphous thin films; structural and microhardness changes; Cu-W system; magnetron sputtering technique.

Sažetak
Pure copper, pure tungsten and amorphous Cu50W50 and Cu66W34 alloy films were deposited by the direct current magnetron sputtering technique on cooled glass substrates. The film microhardness has been investigated as a function of alloy composition and substrate potential bias during deposition. The microhardness exhibited a maximum at Cu concentration close to 50 at%, similar to the case of completely miscible binary alloys. The ion bombardment caused by the negative substrate polarization increased the film microhardness. The annealing of the amorphous Cu-W films up to 250 oC in vacuum increased the film microhardness by 10-20% apparently owing to the formation of the W(Cu) crystalline phase dispersed within a predominantly amorphous film matrix.

Izvorni jezik
Engleski

Znanstvena područja
Fizika, Kemija

POVEZANOST RADA