Pregled bibliografske jedinice broj: 1218723
An ion beam spot size monitor based on a nano- machined Si photodiode probed by means of the ion beam induced charge technique
An ion beam spot size monitor based on a nano- machined Si photodiode probed by means of the ion beam induced charge technique // Vacuum, 205 (2022), 111392, 8 doi:10.1016/j.vacuum.2022.111392 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 1218723 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
An ion beam spot size monitor based on a nano-
machined Si photodiode probed by means of the ion
beam induced charge technique
Autori
Andrini, G. ; Nieto Hernández, E. ; Provatas, Georgios ; Brajković, Marko ; Crnjac, Andreo ; Tchernij, S. Ditalia ; Forneris, J. ; Rigato, V. ; Campostrini, M. ; Siketić, Zdravko ; Jakšić, Milko ; Vittone, E.
Izvornik
Vacuum (0042-207X) 205
(2022);
111392, 8
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Charge collection efficiency ; Silicon ; Ion beam induced charge (IBIC) ; Ion microbeam
Sažetak
In this work the utilization of the Ion Beam Induced Charge (IBIC) technique is explored to assess the resolution a 2 MeV Li + ion microbeam raster scanning a micrometer-sized FIB-machined hollows in a silicon photodiode. The analysis of the maps crossing the FIB machined structures evidenced a drop in charge collection efficiency across the perimeter of the hollows combined with a significant recovery of the signal amplitude at the center of the microstructures, thus forming a micrometer-sized feature which can be exploited to estimate the resolution of the probing beam. The results were interpreted according to numerical simulations based on the Shockley-Ramo-Gunn as originating from a FIB-induced surface space charge density. These results offered additional information with respect to what achievable by a confocal photocurrent microscopy analysis of the same device, due to the significantly shorter focal depth of the latter with respect to the probing ion beam. This study suggests the viability of an effective method to evaluate of the resolution of ion microbeams in processes and experiments, which could be beneficial in emerging fields (deterministic implantation, micro-radiobiology, ion lithography) demanding beam spot sizes below the micrometer scale.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut "Ruđer Bošković", Zagreb
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus