Pregled bibliografske jedinice broj: 1043565
Dynamics of the radiation induced defects in semiconductors studied by pulsed ion beams and micro RBS channeling
Dynamics of the radiation induced defects in semiconductors studied by pulsed ion beams and micro RBS channeling // Abstract Book - 13th European Conference on Accelerators in Applied Research and Technology / Siketić, Z ; Crnjac, A ; Brajković, M ; Barac, M ; Vukšić, M (ur.).
Zagreb: Institut Ruđer Bošković, 1999. P-A-41, 1 (poster, međunarodna recenzija, sažetak, znanstveni)
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Naslov
Dynamics of the radiation induced defects in semiconductors studied by pulsed ion beams and micro RBS channeling
Autori
Crnjac, A ; Fazinić, S ; Jakšić, M
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
Abstract Book - 13th European Conference on Accelerators in Applied Research and Technology
/ Siketić, Z ; Crnjac, A ; Brajković, M ; Barac, M ; Vukšić, M - Zagreb : Institut Ruđer Bošković, 1999
ISBN
978-953-7941-30-7
Skup
13th European Conference on Accelerators in Applied Research and Technology
Mjesto i datum
Split, Hrvatska, 05.05.2019. - 10.05.2019
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
RBS channeling, ion microprobe, semiconductors
Sažetak
Irradiation with pulsed ion beams is used to induce defects in semiconductor materials. Point defects are created around ion tracks in the crystal lattice. Pulsed pause time allows for defects recombinations before new radiation sequence. Defect dynamics are studied by varying pulsed pause times and controlling sample temperature. Relative number of defects in irradiated areas is quantified by means of RBS channeling technique, which was performed ex-situ. During channeling, beam spot size is focused to less than 10 micrometer dimension, and beam scanning allows to locate irradiated areas with RBSc used as the microscopic position sensitive technique. Experiment results are used to interpret the effect of beam pulsing time and sample temperature on the relative number of radiation induced defects in investigated semiconductor materials.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut "Ruđer Bošković", Zagreb