Pregled bibliografske jedinice broj: 966694
Electric field assisted dissolution as a method for Ti and Ge soda-lime glass doping
Electric field assisted dissolution as a method for Ti and Ge soda-lime glass doping // 13th International Conference on Surfaces, Coatings and Nanostructured Materials (NANOSMAT) : Abstracts book
Gdanjsk: Gdansk University of Technology, 2018. str. 29-30 (poster, međunarodna recenzija, sažetak, znanstveni)
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Naslov
Electric field assisted dissolution as a method for
Ti and Ge soda-lime glass doping
Autori
Blažek Bregović, Vesna ; Fabijanić, Ivana ; Okorn, Boris ; Sancho-Parramon, Jordi ; Janicki, Vesna
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
13th International Conference on Surfaces, Coatings and Nanostructured Materials (NANOSMAT) : Abstracts book
/ - Gdanjsk : Gdansk University of Technology, 2018, 29-30
Skup
13th International Conference on Surfaces, Coatings and Nanostructured Materials (NANOSMAT)
Mjesto i datum
Gdańsk, Poljska, 11.09.2018. - 14.09.2018
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
electric field assisted dissolution ; metal thin films ; ellipsometry ; metal ions glass doping ; optical characterization
Sažetak
Glasses doped with metal ions are used in optoelectronics, photonics or for sensing purposes They are also the base for production of glass- metal nanocomposites with embedded metal nanoparticles, such as Ag, Au or Cu. Besides ion- exchange process, where metal dopants are usually introduced into the glass by immersing into a molten salt bath containing the dopant ions, there is another technique that involves moderately elevated temperatures and electric field assistance to direct the dopant ions towards the glass matrix. In this technique, called electric field assisted dissolution (EFAD), the source of ions can be a thin metal film deposited onto the glass surface. Besides noble metals, like Ag, Au and Cu that are the most commonly studied in the research on the process itself and its application, there are few studies involving EFAD of other metals, like Cu, Co or Cr. The intention of the present work is to enlarge this list to other metals that can be used in optoelectronics or photonics. Therefore, thin films of metals such as Ti, In, Zn and Ge will be deposited by electron beam evaporation onto soda-lime glass and subject to EFAD. The samples will be studied with SIMS in order to relate the resulting dopant concentration distribution in the substrate to the EFAD conditions. For optical properties characterization, ellipsometry measurements will be performed before and after post-treatment annealing. The results will be compared with those of noble metals. In summary, this study will show the potential of using EFAD in other materials and in this way expand its range of applications.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Projekti:
HRZZ-IP-2016-06-2168 - Razlaganje električnim poljem u tankim optičkim slojevima - nanostrukturiranje, dopiranje, porozni slojevi (REPTOSNANODOPS) (Janicki, Vesna, HRZZ - 2016-06) ( CroRIS)
Ustanove:
Institut "Ruđer Bošković", Zagreb
Profili:
Vesna Janicki
(autor)
Jordi Sancho Parramon
(autor)
Boris Okorn
(autor)
Ivana Fabijanić
(autor)
Vesna Blažek Bregović
(autor)