Pregled bibliografske jedinice broj: 952506
Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants
Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants // ChemPhysChem, 19 (2018), 1-5 doi:10.1002/cphc.201800341 (međunarodna recenzija, članak, znanstveni)
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Naslov
Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants
Autori
Redzheb, Murad ; Okudur, Oguzhan Orkut ; Bernstorff, Sigrid ; Juraić, Krunoslav ; Van Der Voort, Pascal ; Armini, Silvia
Izvornik
ChemPhysChem (1439-4235) 19
(2018);
1-5
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Gemini surfactants ; mesoporous materials ; organosilica ; self-assembly ; thin films
Sažetak
Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation‐induced self‐ assembly of 1, 2‐bis(triethoxysilyl)ethane and an ionic Gemini 16‐12‐16 surfactant under acidic conditions. The films were characterized by Fourier‐transform infrared spectroscopy, grazing‐ incidence small‐angle X‐ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
- MEDLINE
