Pregled bibliografske jedinice broj: 783355
Study of TiO nanostructures for thin film photovoltaics by small angle X-ray scattering
Study of TiO nanostructures for thin film photovoltaics by small angle X-ray scattering // XXIV. International Materials Research Congress : abstracts
Cancún, Meksiko, 2015. str. S5B-O052 (predavanje, međunarodna recenzija, sažetak, znanstveni)
CROSBI ID: 783355 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Study of TiO nanostructures for thin film photovoltaics by small angle X-ray scattering
Autori
Gracin, Davor ; Meljanac, Daniel ; Juraić, Krunoslav ; Plodinec, Milivoj ; Salamon, Krešimir ; Bernstorff, Sigrid ; Čeh, Miran
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
XXIV. International Materials Research Congress : abstracts
/ - , 2015, S5B-O052
Skup
International Materials Research Congress (24 ; 2015)
Mjesto i datum
Cancún, Meksiko, 16.08.2015. - 20.08.2015
Vrsta sudjelovanja
Predavanje
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
titanium oxide ; thin film photovoltaics ; small angle x-ray scattering
Sažetak
TiO2 is material considered as a prominent cathode electrode material in solar cells. Among all the different shapes of this material the nanostructure thin films have raised a lot of interest in the last decade. TiO2 is one of the most intensively investigated compounds in material science due to its essential properties. It is a wide band gap semiconductor having band-edge positions appropriate for solar cell applications and for hydrogen generation by water splitting. It is also known as a non-toxic, environment friendly, corrosion-resistant material. In particular, TiO2 nanocrystal is a very active photocatalytic material that has many powerful applications in biomedicine, environment technology and photochemistry. Nano forms of TiO2 such as nanoparticles, nanorods, nanowires and, in particular nanotubes may allow obtaining high efficiency photoelectrochemical devices. The TiO2 nano porous and meso porous thin films were prepared by chemical and plasma etching of thin Ti films prepared by evaporation and magnetron sputtering. The parameters of initial film growth were varied in order to obtain various initial structures in particularly the crystal orientation, crystallinity, grain size, and porosity. The as deposited films were etching using various concentrations of acid and under various voltage and current densities. The properties were estimated upon small and wide angle x-ray scattering under grazing incidence angles and by X-ray reflectivity and correlated with condition of formation. The nanostructures estimated upon X-ray scattering were correlated with results obtained by high resolution electron microscopy and advantages and disadvantages of these methods were discussed.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut "Ruđer Bošković", Zagreb
Profili:
Davor Gracin
(autor)
Milivoj Plodinec
(autor)
Krunoslav Juraić
(autor)
Krešimir Salamon
(autor)
Daniel Meljanac
(autor)