Pregled bibliografske jedinice broj: 74742
Reactions of Copper on the Au(111) Surface in the Underpotential Deposition Region from Chloride Solutions
Reactions of Copper on the Au(111) Surface in the Underpotential Deposition Region from Chloride Solutions // Langmuir, 17 (2001), 14; 4347-4351 (međunarodna recenzija, članak, znanstveni)
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Naslov
Reactions of Copper on the Au(111) Surface in the Underpotential Deposition Region from Chloride Solutions
Autori
Krznarić, Damir ; Goričnik, Tihana
Izvornik
Langmuir 17
(2001), 14;
4347-4351
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Au(111) electrode; Copper underpotential deposition; Chloride
Sažetak
The reactions of copper on Au(111) electrode in the underpotential deposition (UPD) region from chloride media were investigated by cyclic voltammetry. Chloride concentrations ranged from trace levels up to 0.55 M. At chloride concentration below 10-3 M three different adlayer structures were detected. At least one of these structures also contains perchlorate ions besides copper and chloride. At NaCl concentrations above 5 x 10-3 M, Cu(I) is stabilized by chloride, and the reduction of copper proceeds as one electron process on the Au(111) surface covered with copper and chloride bilayer but not on Au(111) free of copper.
Izvorni jezik
Engleski
Znanstvena područja
Kemija
POVEZANOST RADA
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- SCI-EXP, SSCI i/ili A&HCI