Pregled bibliografske jedinice broj: 724192
Electron Transport in Thin-Body InGaAs-OI MOSFETs: A Theoretical Viewpoint
Electron Transport in Thin-Body InGaAs-OI MOSFETs: A Theoretical Viewpoint // 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Workshop on Carrier Transport in Nano-Transistors / Tsuchiya, H. ; Kamakura, Y. (ur.).
Yokohama, 2014. str. 1-42 (pozvano predavanje, međunarodna recenzija, pp prezentacija, znanstveni)
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Naslov
Electron Transport in Thin-Body InGaAs-OI MOSFETs: A Theoretical Viewpoint
Autori
Poljak, Mirko ; Suligoj, Tomislav
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, pp prezentacija, znanstveni
Izvornik
2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Workshop on Carrier Transport in Nano-Transistors
/ Tsuchiya, H. ; Kamakura, Y. - Yokohama, 2014, 1-42
Skup
2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Workshop on Carrier Transport in Nano-Transistors
Mjesto i datum
Yokohama, Japan, 08.09.2014
Vrsta sudjelovanja
Pozvano predavanje
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
ingaas; electron mobility; utra-thin body; transport; scattering; quantum confinement; valley repopulation
Sažetak
This talk gives a description of theory and numerical simulation methods for electron transport in ultra-thin InGaAs layers. Effects of quantum confinement are self-consistently calculated, and bandstructure effects (existence of multiple valleys and thickness-dependent effective masses) are included. Electron mobility is calculated by taking into consideration the following scattering mechanisms: polar and nonpolar optical and acoustic phonons, Coulomb, surface roughness, and alloy scattering. Impact of device architecture (single and double gate) is also discussed.
Izvorni jezik
Engleski
Znanstvena područja
Elektrotehnika
POVEZANOST RADA
Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb