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Pregled bibliografske jedinice broj: 579550

Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering

Zhang. J.; Xie, Q.; Liang, Y.; Zeng, W.; Xiao, Q.; Chen, Q.; Borjanović, Vesna; Jakšić, Milko; Karlušić, Marko; Gržeta, Biserka et al.
Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering // Physics procedia, 11 (2011), 126-129 doi:10.1016/j.phpro.2011.01.020 (međunarodna recenzija, članak, znanstveni)

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Naslov
Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering

Autori
Zhang. J. ; Xie, Q. ; Liang, Y. ; Zeng, W. ; Xiao, Q. ; Chen, Q. ; Borjanović, Vesna ; Jakšić, Milko ; Karlušić, Marko ; Gržeta, Biserka ; Yamada, K. ; Luo, J.

Izvornik
Physics procedia (1875-3892) 11 (2011); 126-129

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
magnetron sputterig ; anneal ; atomic diffusion ; silicide

Sažetak
Iron filmswere deposited onto the Si (100) substrates by DC-magnetron sputterig and susequently annealed in the temperature range of 873 to 1273 K for 2 hours. Rutherford backscattering analysis was performed to determine the elemental depth profiles and the oxidation process in samples. The silicides formation was characterized by X-ray diffraction. The results indicate that annealing at 873 K causes only a smallmixing of the Fe and Si atoms near the Fe/Si interface, while the 973 K annealing enhances the atomic diffusion and yealds to a graded concentration distribution of Fe and Si. The metal-rich silicides start to nucleate and grow at 973 K and only alpha-FeSi2 formation is conduced after annealing at 1273 K for 2 hours.

Izvorni jezik
Engleski

Znanstvena područja
Fizika

Napomena
Rad je kao poster prezentiran na skupu APAC-SILICIDE 2010 Tsukuba Asia-Pacific Conference on Semiconducting Silicides and Related Materials Science and Technology Towards Sustainable Optoelectronics, održanom od 24.-26.7.2010., Tsukuba, Ibaraki, Japan ; objavljen u Knjizi sažetaka.



POVEZANOST RADA

Projekti:
098-0982886-2893 - Dopirani optoelektronički i keramički nanomaterijali (Gržeta, Biserka, MZOS ) ( CroRIS)
098-1191005-2876 - Procesi interakcije ionskih snopova i nanostrukture (Jakšić, Milko, MZOS ) ( CroRIS)

Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb,
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Ying Chen (autor)

Avatar Url Milko Jakšić (autor)

Avatar Url Vesna Borjanović (autor)

Avatar Url Biserka Gržeta (autor)

Poveznice na cjeloviti tekst rada:

doi www.sciencedirect.com doi.org

Citiraj ovu publikaciju:

Zhang. J.; Xie, Q.; Liang, Y.; Zeng, W.; Xiao, Q.; Chen, Q.; Borjanović, Vesna; Jakšić, Milko; Karlušić, Marko; Gržeta, Biserka et al.
Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering // Physics procedia, 11 (2011), 126-129 doi:10.1016/j.phpro.2011.01.020 (međunarodna recenzija, članak, znanstveni)
Zhang. J., Xie, Q., Liang, Y., Zeng, W., Xiao, Q., Chen, Q., Borjanović, V., Jakšić, M., Karlušić, M. & Gržeta, B. (2011) Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering. Physics procedia, 11, 126-129 doi:10.1016/j.phpro.2011.01.020.
@article{article, author = {Xie, Q. and Liang, Y. and Zeng, W. and Xiao, Q. and Chen, Q. and Borjanovi\'{c}, Vesna and Jak\v{s}i\'{c}, Milko and Karlu\v{s}i\'{c}, Marko and Gr\v{z}eta, Biserka and Yamada, K. and Luo, J.}, year = {2011}, pages = {126-129}, DOI = {10.1016/j.phpro.2011.01.020}, keywords = {magnetron sputterig, anneal, atomic diffusion, silicide}, journal = {Physics procedia}, doi = {10.1016/j.phpro.2011.01.020}, volume = {11}, issn = {1875-3892}, title = {Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering}, keyword = {magnetron sputterig, anneal, atomic diffusion, silicide} }
@article{article, author = {Xie, Q. and Liang, Y. and Zeng, W. and Xiao, Q. and Chen, Q. and Borjanovi\'{c}, Vesna and Jak\v{s}i\'{c}, Milko and Karlu\v{s}i\'{c}, Marko and Gr\v{z}eta, Biserka and Yamada, K. and Luo, J.}, year = {2011}, pages = {126-129}, DOI = {10.1016/j.phpro.2011.01.020}, keywords = {magnetron sputterig, anneal, atomic diffusion, silicide}, journal = {Physics procedia}, doi = {10.1016/j.phpro.2011.01.020}, volume = {11}, issn = {1875-3892}, title = {Atomic diffusion in the interface of Fe/Si prepared by magnetron sputtering}, keyword = {magnetron sputterig, anneal, atomic diffusion, silicide} }

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