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Pregled bibliografske jedinice broj: 537189

Low Temperature Deposition of SiNx Thin Films by the LPCVD Method

Tijanić, Zdenko; Ristić, Davor; Ivanda, Mile; Bogdanović - Radović, Ivancica; Marciuš, Marijan; Ristić, Mira; Gamulin, Ozren; Musić, Svetozar; Furić, Kresimir; Chiasera, Alesandro et al.
Low Temperature Deposition of SiNx Thin Films by the LPCVD Method // Proceedings of 34nd International Convention MIPRO 2011 / Biljanovic, Petar ; Skala, Karol (ur.).
Rijeka: Denona, 2011. str. 45-46 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)

CROSBI ID: 537189 Za ispravke kontaktirajte CROSBI podršku putem web obrasca

Naslov
Low Temperature Deposition of SiNx Thin Films by the LPCVD Method

Autori
Tijanić, Zdenko ; Ristić, Davor ; Ivanda, Mile ; Bogdanović - Radović, Ivancica ; Marciuš, Marijan ; Ristić, Mira ; Gamulin, Ozren ; Musić, Svetozar ; Furić, Kresimir ; Chiasera, Alesandro ; Ferrari, Maurizio ; Righini, Giancarlo Cesare

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of 34nd International Convention MIPRO 2011 / Biljanovic, Petar ; Skala, Karol - Rijeka : Denona, 2011, 45-46

ISBN
978-953-233-060-1

Skup
34th international conference MIPRO 2011

Mjesto i datum
Opatija, Hrvatska, 24.05.2011. - 27.05.2011

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
silicon-rich nitride; LPCVD

Sažetak
Thin silicon rich nitride (SiNx) films were deposited using the LPCVD (Low Pressure Chemical Vapor Deposition) method. Films with the different values of the nitrogen content were deposited by varying the ratio of the flows of ammonia and silane in the horizontal tube reactor. The films were characterized in terms on the surface quality (by scanning electron microscopy), in terms of the nitrogen content x by time of flight elastic recoil detection analysis and by Raman and FTIR spectroscopy.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA

Projekti:
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Ivanda, Mile, MZOS ) ( CroRIS)

Ustanove:
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Marijan Marciuš (autor)

Avatar Url Mira Ristić (autor)

Avatar Url Svetozar Musić (autor)

Avatar Url Mile Ivanda (autor)

Avatar Url Krešimir Furić (autor)

Avatar Url Ivančica Bogdanović Radović (autor)

Avatar Url Ozren Gamulin (autor)

Avatar Url Davor Ristić (autor)

Citiraj ovu publikaciju:

Tijanić, Zdenko; Ristić, Davor; Ivanda, Mile; Bogdanović - Radović, Ivancica; Marciuš, Marijan; Ristić, Mira; Gamulin, Ozren; Musić, Svetozar; Furić, Kresimir; Chiasera, Alesandro et al.
Low Temperature Deposition of SiNx Thin Films by the LPCVD Method // Proceedings of 34nd International Convention MIPRO 2011 / Biljanovic, Petar ; Skala, Karol (ur.).
Rijeka: Denona, 2011. str. 45-46 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
Tijanić, Z., Ristić, D., Ivanda, M., Bogdanović - Radović, I., Marciuš, M., Ristić, M., Gamulin, O., Musić, S., Furić, K. & Chiasera, A. (2011) Low Temperature Deposition of SiNx Thin Films by the LPCVD Method. U: Biljanovic, P. & Skala, K. (ur.)Proceedings of 34nd International Convention MIPRO 2011.
@article{article, author = {Tijani\'{c}, Zdenko and Risti\'{c}, Davor and Ivanda, Mile and Bogdanovi\'{c} - Radovi\'{c}, Ivancica and Marciu\v{s}, Marijan and Risti\'{c}, Mira and Gamulin, Ozren and Musi\'{c}, Svetozar and Furi\'{c}, Kresimir and Chiasera, Alesandro and Ferrari, Maurizio and Righini, Giancarlo Cesare}, year = {2011}, pages = {45-46}, keywords = {silicon-rich nitride, LPCVD}, isbn = {978-953-233-060-1}, title = {Low Temperature Deposition of SiNx Thin Films by the LPCVD Method}, keyword = {silicon-rich nitride, LPCVD}, publisher = {Denona}, publisherplace = {Opatija, Hrvatska} }
@article{article, author = {Tijani\'{c}, Zdenko and Risti\'{c}, Davor and Ivanda, Mile and Bogdanovi\'{c} - Radovi\'{c}, Ivancica and Marciu\v{s}, Marijan and Risti\'{c}, Mira and Gamulin, Ozren and Musi\'{c}, Svetozar and Furi\'{c}, Kresimir and Chiasera, Alesandro and Ferrari, Maurizio and Righini, Giancarlo Cesare}, year = {2011}, pages = {45-46}, keywords = {silicon-rich nitride, LPCVD}, isbn = {978-953-233-060-1}, title = {Low Temperature Deposition of SiNx Thin Films by the LPCVD Method}, keyword = {silicon-rich nitride, LPCVD}, publisher = {Denona}, publisherplace = {Opatija, Hrvatska} }

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