Pregled bibliografske jedinice broj: 537145
Thermal decomposition of silicon-rich oxides deposited by the LPCVD method
Thermal decomposition of silicon-rich oxides deposited by the LPCVD method // Proceedings of 34nd International Convention MIPRO 2011 , vol. 1 MEET & GVS / Biljanovic, Petar ; Skala, Karol (ur.).
Rijeka: Denona, 2011. str. 47-48 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
CROSBI ID: 537145 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Thermal decomposition of silicon-rich oxides deposited by the LPCVD method
Autori
Ristić, Davor ; Ivanda, Mile ; Furić, Krešimir ; Chiasera, Alessandro ; Moser, Enrico ; Ferrari, Maurizio
Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni
Izvornik
Proceedings of 34nd International Convention MIPRO 2011 , vol. 1 MEET & GVS
/ Biljanovic, Petar ; Skala, Karol - Rijeka : Denona, 2011, 47-48
ISBN
978-953-233-060-1
Skup
34nd International Convention MIPRO 2011
Mjesto i datum
Opatija, Hrvatska, 23.05.2011. - 27.05.2011
Vrsta sudjelovanja
Predavanje
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
Silicon rich oxide; Low Pressure Chemical Vapour Deposition; Raman spectroscopy
Sažetak
Silicon-rich oxide(SiOx, 0<x<2) thin films were deposited using the Low Pressure Chemical Vapor Deposition (LPCVD) method at temperature of 570 oC using silane (SiH4) and oxygen as the reactant gasses. The films were annealed at temperatures of 800 oC, 900 oC, 1000 oC and 1100 oC to induce the separation of excess silicon in the SiOx films into nanosized crystalline silicon particles inside an amorphous SiOx matrix. The size of the silicon particles was determined using Raman spectroscopy.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Projekti:
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Ivanda, Mile, MZOS ) ( CroRIS)
Ustanove:
Institut "Ruđer Bošković", Zagreb
