Pregled bibliografske jedinice broj: 480478
Optical properties of porous silicon on an insulator layer
Optical properties of porous silicon on an insulator layer // EUCMOS 2010 30th European Congress on Molecular Spectroscopy / Becucci, Maurizio ; Gellini, Cristina ; Schettino, Vicenzo (ur.).
Firenza : München, 2010. str. 195-195 (poster, međunarodna recenzija, sažetak, znanstveni)
CROSBI ID: 480478 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Optical properties of porous silicon on an insulator layer
Autori
Balarin, Maja ; Gamulin, Ozren ; Ivanda, Mile ; Kosović, Marin ; Ristić, Davor ; Ristić, Mira ; Musić, Svetozar ; Furić, Krešimir
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
EUCMOS 2010 30th European Congress on Molecular Spectroscopy
/ Becucci, Maurizio ; Gellini, Cristina ; Schettino, Vicenzo - Firenza : München, 2010, 195-195
Skup
EUCMOS 2010 30th European Congress on Molecular Spectroscopy
Mjesto i datum
Firenca, Italija, 29.08.2010. - 03.09.2010
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
Porous silicon; Raman spectroscopy; SEM
Sažetak
Silicon wafers, consisting of 280 microm tick n-type (Sb doped) upper layer and 20 microm n-type (P doped) lower layer, were electrochemically etched in hydrofluoric acid (HF) ethanol solution. The resistivity of upper layer was 0.015 Ohmcm, while the lower layer was much worse conductor with resistivity 2 Ohmcm. Porous silicon (PS) samples were produced by etching the non polished side of wafers at the constant current density. The etching process was performed with different concentration of HF in ethanol solution. It was found that such n-type silicon on insulator can be selectively etched without illumination. The possible mechanism of the etching phenomenon is discussed. Samples were investigated by Raman spectroscopy, photoluminescence (PL) and scanning electron microscopy (SEM). The most intensive photoluminescence peak showed samples which were etched with the lowest HF concentration. The Raman spectra of all samples showed broadened and red-shifted transversal optical (TO) phonon bands. SEM images showed high density of less than 100 nm sized pores whose density and morphology depended on HF concentration. The etching of the unpolished side of wafers caused interesting topography, presented in electron micrograph Fig. 1 b), and inhomogeneous luminescence presented in Fig. 1 a). Figure 1 c) shows the high magnification FE-SEM micrograph of strong luminescence region with nanometers pores in silicon.
Izvorni jezik
Engleski
Znanstvena područja
Fizika, Kemija
POVEZANOST RADA
Projekti:
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Ivanda, Mile, MZOS ) ( CroRIS)
098-0982904-2952 - Sinteza i mikrostruktura metalnih oksida i oksidnih stakala (Ristić, Mira, MZOS ) ( CroRIS)
108-1080134-3105 - Mehanizmi narušavanja strukture lipoproteina djelovanjem vanjskih čimbenika (Gamulin, Ozren, MZOS ) ( CroRIS)
Ustanove:
Institut "Ruđer Bošković", Zagreb,
Medicinski fakultet, Zagreb
Profili:
Mira Ristić
(autor)
Svetozar Musić
(autor)
Mile Ivanda
(autor)
Maja Balarin
(autor)
Krešimir Furić
(autor)
Marin Kosović
(autor)
Ozren Gamulin
(autor)
Davor Ristić
(autor)