Pregled bibliografske jedinice broj: 461907
Electron stimulated desorption of positive and negative ions from SiO2/Si surfaces
Electron stimulated desorption of positive and negative ions from SiO2/Si surfaces // Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 78 (1993), 1-4; 333-336 doi:10.1016/0168-583X(93)95821-L (međunarodna recenzija, članak, znanstveni)
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Naslov
Electron stimulated desorption of positive and negative ions from SiO2/Si surfaces
Autori
Petravić, Mladen ; Williams, J.S. ; Wong, C.W.
Izvornik
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (0168-583X) 78
(1993), 1-4;
333-336
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
ESD ; positive and negative ions ; SiO2/Si
Sažetak
We have examined the role of core-hole excitations in electron stimulated desorption (ESD) of positive and negative hydrogen and oxygen ions from SiO2/Si. Thresholds observed for positive ion emission at electron energies above 100 eV are correlated with core-level binding energies of substrate atoms and explained in terms of interatomic Auger transitions. Desorption of negative ions closely follows threshold behaviour of corresponding positive ions ; it is explained in terms of a charge exchange process in which the outgoing positive ions (or neutrals) capture electrons in the surface region and desorb as negative ions.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
Citiraj ovu publikaciju:
Časopis indeksira:
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
