Pregled bibliografske jedinice broj: 433815
Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix
Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix // Journal of Applied Physics, 106 (2009), 8; 084319, 6 doi:10.1063/1.3248373 (međunarodna recenzija, članak, znanstveni)
CROSBI ID: 433815 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix
Autori
Buljan, Maja ; Pinto Sara ; Kashtiban, Reza J. ; Rolo, Anabela G. ; Chahboun, A. ; Bangert, Ursel ; Levichev, Sergey ; Holy, Vaclav ; Gomes, Maria J. M.
Izvornik
Journal of Applied Physics (0021-8979) 106
(2009), 8;
084319, 6
Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni
Ključne riječi
Semiconductor quantum dots ; SiGe ; GISAXS
Sažetak
In this paper, we present a study of structural properties of SiGe quantum dots formed in amorphous silica matrix by magnetron sputtering technique. We investigate deposition conditions leading to the formation of dense and uniformly sized quantum dots, distributed homogeneously in the matrix. X-ray and Raman spectroscopy were used to estimate the Si content. A detailed analysis based on grazing incidence small angle X-ray scattering revealed the influence of the deposition conditions on quantum dot sizes, size distributions, spatial arrangement and concentration of quantum dots in the matrix, as well as the Si:Ge content.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Projekti:
098-0982886-2866 - Temeljna svojstva nanostruktura i defekata u poluvodičima i dielektricima (Pivac, Branko, MZOS ) ( CroRIS)
Ustanove:
Institut "Ruđer Bošković", Zagreb
Profili:
Maja Mičetić
(autor)
Citiraj ovu publikaciju:
Časopis indeksira:
- Current Contents Connect (CCC)
- Web of Science Core Collection (WoSCC)
- Science Citation Index Expanded (SCI-EXP)
- SCI-EXP, SSCI i/ili A&HCI
- Scopus
