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Pregled bibliografske jedinice broj: 377673

Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix

Buljan, Maja; Desnica, Uroš V.; Dražić, Goran; Ivanda, Mile; Radić, Nikola; Dubček, Pavo; Salamon, Krešimir; Bernsdorff, Sigrid; Holy, Vaclav
Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix // Nanotechnology, 20 (2009), 8; 085612-085618 doi:10.1088/0957-4484/20/8/085612 (međunarodna recenzija, članak, znanstveni)

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Naslov
Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix

Autori
Buljan, Maja ; Desnica, Uroš V. ; Dražić, Goran ; Ivanda, Mile ; Radić, Nikola ; Dubček, Pavo ; Salamon, Krešimir ; Bernsdorff, Sigrid ; Holy, Vaclav

Izvornik
Nanotechnology (0957-4484) 20 (2009), 8; 085612-085618

Vrsta, podvrsta i kategorija rada
Radovi u časopisima, članak, znanstveni

Ključne riječi
(Ge+SiO2)/SiO2 multilayer films; spatial correlation of quantum dots

Sažetak
We studied structural properties of (Ge+SiO2)/SiO2 multilayer films especially the influence of the deposition temperature and the parameters of subsequent annealing on the formation and spatial correlation of Ge quantum dots in amorphous silica matrix. We showed that in-layer and inter-layer spatial correlations of the formed Ge quantum dots strongly depend on the deposition temperature. For suitable chosen deposition parameters, highly correlated dot positions in all three dimensions can be obtained. It is demonstrated that the degree of the spatial correlation of quantum dots influences the size distribution width, which further affects the macroscopic properties of the quantum dot arrays.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA

Projekti:
035-0352843-2844 - Veza strukturnih i fizikalnih svojstava materijala kontrolirane dimenzionalnosti (Milat, Ognjen, MZOS ) ( CroRIS)
098-0982886-2895 - Novi amorfni i nanostrukturirani tankoslojni materijali (Radić, Nikola, MZOS ) ( CroRIS)
098-0982886-2897 - Poluvodički materijali za optoelektroniku i nanotehnologiju (Šantić, Branko, MZOS ) ( CroRIS)
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Ivanda, Mile, MZOS ) ( CroRIS)
098-0982886-2866 - Temeljna svojstva nanostruktura i defekata u poluvodičima i dielektricima (Pivac, Branko, MZOS ) ( CroRIS)

Ustanove:
Institut za fiziku, Zagreb,
Institut "Ruđer Bošković", Zagreb

Profili:

Avatar Url Nikola Radić (autor)

Avatar Url Mile Ivanda (autor)

Avatar Url Pavo Dubček (autor)

Avatar Url Maja Mičetić (autor)

Avatar Url Krešimir Salamon (autor)

Avatar Url Uroš Desnica (autor)

Poveznice na cjeloviti tekst rada:

doi stacks.iop.org

Citiraj ovu publikaciju:

Buljan, Maja; Desnica, Uroš V.; Dražić, Goran; Ivanda, Mile; Radić, Nikola; Dubček, Pavo; Salamon, Krešimir; Bernsdorff, Sigrid; Holy, Vaclav
Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix // Nanotechnology, 20 (2009), 8; 085612-085618 doi:10.1088/0957-4484/20/8/085612 (međunarodna recenzija, članak, znanstveni)
Buljan, M., Desnica, U., Dražić, G., Ivanda, M., Radić, N., Dubček, P., Salamon, K., Bernsdorff, S. & Holy, V. (2009) Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix. Nanotechnology, 20 (8), 085612-085618 doi:10.1088/0957-4484/20/8/085612.
@article{article, author = {Buljan, Maja and Desnica, Uro\v{s} V. and Dra\v{z}i\'{c}, Goran and Ivanda, Mile and Radi\'{c}, Nikola and Dub\v{c}ek, Pavo and Salamon, Kre\v{s}imir and Bernsdorff, Sigrid and Holy, Vaclav}, year = {2009}, pages = {085612-085618}, DOI = {10.1088/0957-4484/20/8/085612}, keywords = {(Ge+SiO2)/SiO2 multilayer films, spatial correlation of quantum dots}, journal = {Nanotechnology}, doi = {10.1088/0957-4484/20/8/085612}, volume = {20}, number = {8}, issn = {0957-4484}, title = {Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix}, keyword = {(Ge+SiO2)/SiO2 multilayer films, spatial correlation of quantum dots} }
@article{article, author = {Buljan, Maja and Desnica, Uro\v{s} V. and Dra\v{z}i\'{c}, Goran and Ivanda, Mile and Radi\'{c}, Nikola and Dub\v{c}ek, Pavo and Salamon, Kre\v{s}imir and Bernsdorff, Sigrid and Holy, Vaclav}, year = {2009}, pages = {085612-085618}, DOI = {10.1088/0957-4484/20/8/085612}, keywords = {(Ge+SiO2)/SiO2 multilayer films, spatial correlation of quantum dots}, journal = {Nanotechnology}, doi = {10.1088/0957-4484/20/8/085612}, volume = {20}, number = {8}, issn = {0957-4484}, title = {Influence of deposition temperature on correlation of Ge quantum dots positions in amorphous silica matrix}, keyword = {(Ge+SiO2)/SiO2 multilayer films, spatial correlation of quantum dots} }

Časopis indeksira:


  • Current Contents Connect (CCC)
  • Web of Science Core Collection (WoSCC)
    • Science Citation Index Expanded (SCI-EXP)
    • SCI-EXP, SSCI i/ili A&HCI
  • Scopus
  • MEDLINE

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