Pregled bibliografske jedinice broj: 365577
Vacancy cluster formation in implanted and in neutron irradiated germanium
Vacancy cluster formation in implanted and in neutron irradiated germanium // Book of abstracts
Strasbourg, 2008. str. j-3 (poster, međunarodna recenzija, sažetak, znanstveni)
CROSBI ID: 365577 Za ispravke kontaktirajte CROSBI podršku putem web obrasca
Naslov
Vacancy cluster formation in implanted and in neutron irradiated germanium
Autori
Rana, M.A. ; Markevich, V. ; Hawkins, I.D. ; Slotte, J. ; Kuitunen, K. ; Tuomisto, I. ; Capan, Ivana ; Pivac, Branko ; Jačimović, Radojko ; Peaker, A.R. ;
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
Book of abstracts
/ - Strasbourg, 2008, J-3
Skup
E-MRS 2008 Spring Meeting
Mjesto i datum
Strasbourg, Francuska, 26.05.2008. - 30.05.2008
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
defects; germanium; neutron irradiation; dlts
Sažetak
During implantation and implantation anneals germanium behaves very differently to silicon. In general the concentration of implantation defects is considerably higher but perhaps the most striking difference is the formation of relatively stable defects which seem to play a role in limiting the electron concentration to much lower levels than those necessary for extremely scaled nMOS. There is strong evidence that these defects are related to vacancy reactions. In this paper we consider the mechanisms which may lead to the formation of such defects using a Monte Carlo simulation of the implantation in conjunction with consideration of coulombic effects during implantation and annealing. Using experimental results derived from DLTS and positron annihilation experiments on self implanted and on neutron irradiated germanium we consider the kinetics of how such clusters may form and conclude that localized type inversion at the end of range plays a key role in the formation of these cluster defects. Possible scenarios for inhibiting the cluster formation are considered including the incorporation of impurities which may act as vacancy traps and the use of thermal treatments which minimize the time spent at temperatures favorable for specific cluster reactions.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Projekti:
098-0982886-2866 - Temeljna svojstva nanostruktura i defekata u poluvodičima i dielektricima (Pivac, Branko, MZOS ) ( CroRIS)
Ustanove:
Institut "Ruđer Bošković", Zagreb