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Pregled bibliografske jedinice broj: 303093

The preparation of thin silica layers by wet thermal oxidation


Gebavi, Hrvoje; Ivanda, Mile; Hršak, Damir; Ristić, Davor; Furić, Krešimir; Musić, Svetozar; Ristić, Mira; Žonja, Sanja; Biljanović, Petar; Gamulin, Ozren et al.
The preparation of thin silica layers by wet thermal oxidation // Proceedings of the VIIth International Conference Preparation of ceramic materials / Plešingerova, Beatrice ; Kuffa, Tarzicius (ur.).
Košice: Technical University of Košice, 2007. str. 105-107 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)


CROSBI ID: 303093 Za ispravke kontaktirajte CROSBI podršku putem web obrasca

Naslov
The preparation of thin silica layers by wet thermal oxidation

Autori
Gebavi, Hrvoje ; Ivanda, Mile ; Hršak, Damir ; Ristić, Davor ; Furić, Krešimir ; Musić, Svetozar ; Ristić, Mira ; Žonja, Sanja ; Biljanović, Petar ; Gamulin, Ozren ; Balarin, Maja ; Montagna, M. ; Ferarri, M. ; Righini, G.C.

Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni

Izvornik
Proceedings of the VIIth International Conference Preparation of ceramic materials / Plešingerova, Beatrice ; Kuffa, Tarzicius - Košice : Technical University of Košice, 2007, 105-107

ISBN
978-80-8073-806-8

Skup
International Conference Preparation of ceramic materials (7 ; 2007)

Mjesto i datum
Košice, Slovačka, 18.07.2007. - 20.07.2007

Vrsta sudjelovanja
Predavanje

Vrsta recenzije
Međunarodna recenzija

Ključne riječi
silica layer; wet thermal oxidation; silicon

Sažetak
The preparation of thin silica layers was done by wet thermal oxidation of silicon in diffusion furnace. Reaction temperature was 1141 °C. The silicon wafer of 5.08 cm in diameter, 280 μ m thicknesses, 111 orientations, n-doped with P has been used as precursor. Thickness of produced layer was 72 - 108 μ m. The base of diffusion furnace was a quartz tube placed in a spiral heater. The flow rate of vapor was constant. Reaction time was varied between 5 and 40 minutes. It was found that there are strong correlation between layer thickness and reaction time. Experimental data confirm theoretical model. When reaction time is longer then 20 minutes experimental data are almost same as theoretical model but there are small deviations at lower temperatures because of thermalization time.

Izvorni jezik
Engleski

Znanstvena područja
Fizika



POVEZANOST RADA


Projekti:
036-0982904-1642 - Sofisticirane poluvodičke strukture za komunikacijsku tehnologiju (Koričić, Marko, MZO ) ( CroRIS)
098-0982904-2898 - Fizika i primjena nanostruktura i volumne tvari (Ivanda, Mile, MZOS ) ( CroRIS)
098-0982904-2952 - Sinteza i mikrostruktura metalnih oksida i oksidnih stakala (Ristić, Mira, MZOS ) ( CroRIS)
108-1080134-3105 - Mehanizmi narušavanja strukture lipoproteina djelovanjem vanjskih čimbenika (Gamulin, Ozren, MZOS ) ( CroRIS)
124-1241565-1524 - Okolišem potpomognuta degradacija metala i adsorpcija na otpadnim C-materijalima (Malina, Jadranka, MZOS ) ( CroRIS)
124-1241565-1559 - Energetska učinkovitost i kvaliteta proizvoda u plastičnoj deformaciji metala (Lazić, Ladislav, MZOS ) ( CroRIS)

Ustanove:
Fakultet elektrotehnike i računarstva, Zagreb,
Institut "Ruđer Bošković", Zagreb,
Medicinski fakultet, Zagreb,
Metalurški fakultet, Sisak


Citiraj ovu publikaciju:

Gebavi, Hrvoje; Ivanda, Mile; Hršak, Damir; Ristić, Davor; Furić, Krešimir; Musić, Svetozar; Ristić, Mira; Žonja, Sanja; Biljanović, Petar; Gamulin, Ozren et al.
The preparation of thin silica layers by wet thermal oxidation // Proceedings of the VIIth International Conference Preparation of ceramic materials / Plešingerova, Beatrice ; Kuffa, Tarzicius (ur.).
Košice: Technical University of Košice, 2007. str. 105-107 (predavanje, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
Gebavi, H., Ivanda, M., Hršak, D., Ristić, D., Furić, K., Musić, S., Ristić, M., Žonja, S., Biljanović, P. & Gamulin, O. (2007) The preparation of thin silica layers by wet thermal oxidation. U: Plešingerova, B. & Kuffa, T. (ur.)Proceedings of the VIIth International Conference Preparation of ceramic materials.
@article{article, author = {Gebavi, Hrvoje and Ivanda, Mile and Hr\v{s}ak, Damir and Risti\'{c}, Davor and Furi\'{c}, Kre\v{s}imir and Musi\'{c}, Svetozar and Risti\'{c}, Mira and \v{Z}onja, Sanja and Biljanovi\'{c}, Petar and Gamulin, Ozren and Balarin, Maja and Montagna, M. and Ferarri, M. and Righini, G.C.}, year = {2007}, pages = {105-107}, keywords = {silica layer, wet thermal oxidation, silicon}, isbn = {978-80-8073-806-8}, title = {The preparation of thin silica layers by wet thermal oxidation}, keyword = {silica layer, wet thermal oxidation, silicon}, publisher = {Technical University of Ko\v{s}ice}, publisherplace = {Ko\v{s}ice, Slova\v{c}ka} }
@article{article, author = {Gebavi, Hrvoje and Ivanda, Mile and Hr\v{s}ak, Damir and Risti\'{c}, Davor and Furi\'{c}, Kre\v{s}imir and Musi\'{c}, Svetozar and Risti\'{c}, Mira and \v{Z}onja, Sanja and Biljanovi\'{c}, Petar and Gamulin, Ozren and Balarin, Maja and Montagna, M. and Ferarri, M. and Righini, G.C.}, year = {2007}, pages = {105-107}, keywords = {silica layer, wet thermal oxidation, silicon}, isbn = {978-80-8073-806-8}, title = {The preparation of thin silica layers by wet thermal oxidation}, keyword = {silica layer, wet thermal oxidation, silicon}, publisher = {Technical University of Ko\v{s}ice}, publisherplace = {Ko\v{s}ice, Slova\v{c}ka} }




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