Pregled bibliografske jedinice broj: 276198
SPUTTER-DEPOSITED AMORPHOUS-LIKE TUNGSTEN
SPUTTER-DEPOSITED AMORPHOUS-LIKE TUNGSTEN, 2004. (izvještaj).
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Naslov
SPUTTER-DEPOSITED AMORPHOUS-LIKE TUNGSTEN
Autori
Radić, Nikola ; Tonejc, Antun ; Ivkov, Jovica ; Dubček, Pavo ; Bernstorff, Sigrid ; Medunić, Zvonko
Izvornik
IBR Elettra Annual Report 2003 Austro SAXS
Vrsta, podvrsta
Ostale vrste radova, izvještaj
Godina
2004
Ključne riječi
tungsten; sputtering; amorphous
Sažetak
The sputter-deposited films tend to have high residual stress, which changes from strongly compressive to tensile with increasing working gas pressure. Simultaneously, phase composition of tungsten films changes from predominantly  -W form to  -W modification. The formation and stabilization of  -W in case of sputter-deposited tungsten films is attributed to the incorporation of oxygen in the film.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut za fiziku, Zagreb,
Institut "Ruđer Bošković", Zagreb,
Prirodoslovno-matematički fakultet, Zagreb
Profili:
Zvonko Medunić
(autor)
Nikola Radić
(autor)
Jovica Ivkov
(autor)
Pavo Dubček
(autor)
Antun Tonejc
(autor)