Pregled bibliografske jedinice broj: 256749
The Resistivity of ZnO coated SnO2 Thin Films to the Hydrogen Plasma
The Resistivity of ZnO coated SnO2 Thin Films to the Hydrogen Plasma // Proceedings of the International Conference held in Dresden, Germany / Poortsman, A ; Ossenbrink, H ; Dunlop, E: Helm, P (ur.).
Dresden: WIP-Renewable Energies, 2006. str. 459-461 (poster, međunarodna recenzija, cjeloviti rad (in extenso), znanstveni)
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Naslov
The Resistivity of ZnO coated SnO2 Thin Films to the Hydrogen Plasma
Autori
Gracin, Davor ; Juraić, Krunoslav ; Ristova, M ; Tanusevski, A ; Georgievska, V ;
Vrsta, podvrsta i kategorija rada
Radovi u zbornicima skupova, cjeloviti rad (in extenso), znanstveni
Izvornik
Proceedings of the International Conference held in Dresden, Germany
/ Poortsman, A ; Ossenbrink, H ; Dunlop, E: Helm, P - Dresden : WIP-Renewable Energies, 2006, 459-461
Skup
21st European Photovoltaic Solar Energy Conference and Exhibition
Mjesto i datum
Dresden, Njemačka, 04.09.2006. - 08.09.2006
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
ZnO; SnO2; APCVD; RF hydrogen plasma
(ZnO; SnO2; APCVD; RF hydrogen plasm)
Sažetak
The thin SnO2 films, deposited by APCVD on glass substrates, were coated with ZnO thin films using APCVD. Thickness, doping type and doping level were varied, in order to obtain high conductivity and transparency in the visible part of the spectrum. After deposition, the films were exposed to the RF hydrogen plasma. The main idea is to maintain good optical and electrical properties of SnO2 as TCO but improve its durability against hydrogen plasma. It is shown that hydrogen plasma affects also the ZnO layer although much less than SnO2.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
