Pregled bibliografske jedinice broj: 171213
Surface features of the sputter-deposited tungsten films
Surface features of the sputter-deposited tungsten films // 10th Joint Vacuum Conferenc, Program and Book of Abstracts / Mozetič, Miran ; Šetina, Janez ; Kovač, Janez (ur.).
Ljubljana: Društvo za vakuumsko tehniko Slovenije, 2004. str. 69-69 (poster, međunarodna recenzija, sažetak, znanstveni)
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Naslov
Surface features of the sputter-deposited tungsten films
Autori
Dubček, Pavo ; Radić, Nikola ; Bernstorff, Sigrid ; Salamon, Krešimir ; Furlan, Andrej ; Panjan, Peter ; Čekada, MIha
Vrsta, podvrsta i kategorija rada
Sažeci sa skupova, sažetak, znanstveni
Izvornik
10th Joint Vacuum Conferenc, Program and Book of Abstracts
/ Mozetič, Miran ; Šetina, Janez ; Kovač, Janez - Ljubljana : Društvo za vakuumsko tehniko Slovenije, 2004, 69-69
Skup
10th Joint Vacuum Conference
Mjesto i datum
Portorož, Slovenija, 28.09.2004. - 02.10.2004
Vrsta sudjelovanja
Poster
Vrsta recenzije
Međunarodna recenzija
Ključne riječi
tungsten films; surface features; magnetron sputtering
Sažetak
Different phases of tungsten were produced by magnetron sputtering either as a single layer or the multilayers. A stable alpha-W phase (b.c.c. structure) is predominantly obtained at low working gas pressure, metastable beta-W phase (A15 structure) is obtained at increased working gas pressure, and amorphous-like tungsten (a-W) is obtained at even higher pressure. The occurence of various phases is related to the oxygen content and built-in stresses in the prepared thin films. We varied the pressure during the preparation to produce tungsten films composed of stacked layers of different tungsten phases. The surface roughness/ topography of such films was examined by the AFM, and subsurface layer structure by the SAXS and X-ray reflectivity measurements. Tungsten multilayers were prepared by sequential deposition of tungsten sputtered under different conditions in a cylindrical magnetron device. Working gas pressure was varied in the range of 0, 7 - 3, 5 Pa, and circular substrates (monocrystalline silicon, borosilicate glass) were cooled in contact with the LN2 container. The deposition rate was about 0, 17 nm/s, and the total film thickness range was 50-200 nm. AFM study revealed complex dependence of surface features on the preparation conditions. SAXS data show presence of surface/ subsurface nanoparticles whose size depends on the top layer phase. Finally, the X-ray reflectivity suggests that the surface roughness is increasing with overall thickness, with Bragg peaks missing in most of the multilayered samples.
Izvorni jezik
Engleski
Znanstvena područja
Fizika
POVEZANOST RADA
Ustanove:
Institut za fiziku, Zagreb,
Institut "Ruđer Bošković", Zagreb